Inventor · Walden, NY, US

Naim Moumen

39Patents

8h-index

74Co-inventors

74Inventor score

Filing activity: Aug 16, 2002 → Mar 14, 2016

Most-cited inventions

Patent	Title	Area	Cited by	Status
US7736954B2	Methods for nanoscale feature imprint molding	Emerging Cross-Sectional Technologies	47	Active
US7741188B2	Deep trench (DT) metal-insulator-metal (MIM) capacitor	Emerging Cross-Sectional Technologies	28	Active
US9178036B1	Methods of forming transistor devices with different threshold voltages and the resulting products	Electricity	19	Active
US7754594B1	Method for tuning the threshold voltage of a metal gate and high-k device	Electricity	16	Active
US7691701B1	Method of forming gate stack and structure thereof	Electricity	13	Active
US7125782B2	Air gaps between conductive lines for reduced RC delay of integrated circuits	Electricity	9	Expired
US7682917B2	Disposable metallic or semiconductor gate spacer	Electricity	9	Active
US6617085B1	Wet etch reduction of gate widths	Electricity	8	Expired
US7498271B1	Nitrogen based plasma process for metal gate MOS device	Electricity	7	Active
US8115097B2	Grid-line-free contact for a photovoltaic cell	Emerging Cross-Sectional Technologies	6	Active
US6905976B2	Structure and method of forming a notched gate field effect transistor	Emerging Cross-Sectional Technologies	6	Expired
US7947549B2	Gate effective-workfunction modification for CMOS	Electricity	5	Active
US8053306B2	PFET with tailored dielectric and related methods and integrated circuit	Electricity	5	Active
US8669466B2	Grid-line-free contact for a photovoltaic cell	Emerging Cross-Sectional Technologies	4	Active
US8753936B2	Changing effective work function using ion implantation during dual work function metal gate integration	Electricity	4	Active
US9564505B2	Changing effective work function using ion implantation during dual work function metal gate integration	Electricity	4	Active
US8183642B2	Gate effective-workfunction modification for CMOS	Electricity	3	Active
US7863123B2	Direct contact between high-κ/metal gate and wiring process flow	Electricity	3	Active
US6987042B2	Method of forming a collar using selective SiGe/Amorphous Si Etch	Electricity	3	Expired
US9461171B2	Methods of increasing silicide to epi contact areas and the resulting devices	Electricity	3	Active
US8778750B2	Techniques for the fabrication of thick gate dielectric	Electricity	3	Active
US7943453B2	CMOS devices with different metals in gate electrodes using spin on low-k material as hard mask	Electricity	2	Active
US8575709B2	High-k dielectric gate structures resistant to oxide growth at the dielectric/silicon substrate interface and methods of manufacture thereof	Electricity	1	Active
US9324896B2	Thermal receiver for high power solar concentrators and method of assembly	Emerging Cross-Sectional Technologies	1	Active
US7495743B2	Immersion optical lithography system having protective optical coating	Physics	1	Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.