Sameer Pradhan
29Patents
6h-index
26Co-inventors
65Inventor score
Filing activity: Mar 3, 2006 → May 18, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7751654B2 | Electro-optic modulation | Physics | 58 | Active |
| US9299801B1 | Method for fabricating a transistor device with a tuned dopant profile | Electricity | 14 | Active |
| US9112057B1 | Semiconductor devices with dopant migration suppression and method of fabrication thereof | Electricity | 10 | Active |
| US9202699B2 | Capping dielectric structure for transistor gates | Electricity | 8 | Active |
| US9177867B2 | Tungsten gates for non-planar transistors | Electricity | 7 | Active |
| US9196727B2 | High uniformity screen and epitaxial layers for CMOS devices | Electricity | 6 | Active |
| US8981435B2 | Source/drain contacts for non-planar transistors | Electricity | 6 | Active |
| US8877619B1 | Process for manufacture of integrated circuits with different channel doping transistor architectures and devices therefrom | Electricity | 6 | Active |
| US9041126B2 | Deeply depleted MOS transistors having a screening layer and methods thereof | Electricity | 4 | Active |
| US9425316B2 | Source/drain contacts for non-planar transistors | Electricity | 3 | Active |
| US8637955B1 | Semiconductor structure with reduced junction leakage and method of fabrication thereof | Electricity | 3 | Active |
| US9853156B2 | Source/drain contacts for non-planar transistors | Electricity | 2 | Active |
| US9577041B2 | Method for fabricating a transistor device with a tuned dopant profile | Electricity | 2 | Active |
| US8883600B1 | Transistor having reduced junction leakage and methods of forming thereof | Electricity | 2 | Active |
| US9368624B2 | Method for fabricating a transistor with reduced junction leakage current | Electricity | 2 | Active |
| US9087915B2 | Interlayer dielectric for non-planar transistors | Electricity | 1 | Active |
| US10056488B2 | Interlayer dielectric for non-planar transistors | Electricity | 1 | Active |
| US9580776B2 | Tungsten gates for non-planar transistors | Electricity | 0 | Active |
| US10020375B2 | Tungsten gates for non-planar transistors | Electricity | 0 | Active |
| US9812546B2 | Tungsten gates for non-planar transistors | Electricity | 0 | Active |
| US9105711B2 | Semiconductor structure with reduced junction leakage and method of fabrication thereof | Electricity | 0 | Active |
| US9634124B2 | Interlayer dielectric for non-planar transistors | Electricity | 0 | Active |
| US10693006B2 | Interlayer dielectric for non-planar transistors | Electricity | 0 | Active |
| US9893148B2 | Method for fabricating a transistor device with a tuned dopant profile | Electricity | 0 | Active |
| US10998445B2 | Interlayer dielectric for non-planar transistors | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.