Wei-Ken Lin
27Patents
3h-index
38Co-inventors
55Inventor score
Filing activity: Jul 29, 2015 → May 23, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9691766B1 | Fin field effect transistor and method for fabricating the same | Electricity | 11 | Active |
| US10340384B2 | Method of manufacturing fin field-effect transistor device | Electricity | 3 | Active |
| US11205597B2 | Semiconductor device and method | Electricity | 3 | Active |
| US10304677B2 | Low-k feature formation processes and structures formed thereby | Electricity | 3 | Active |
| US10658252B2 | Semiconductor structure and method for forming the same | Electricity | 2 | Active |
| US10497577B2 | Fin field-effect transistor device and method | Electricity | 2 | Active |
| US10797175B2 | Fin field-effect transistor device and method | Electricity | 2 | Active |
| US10269664B2 | Semiconductor structure and method for forming the same | Electricity | 1 | Active |
| US10964548B2 | Fin field-effect transistor device and method | Electricity | 1 | Active |
| US10833170B2 | Low-k gate spacer and methods for forming the same | Electricity | 1 | Active |
| US10950431B2 | Low-k feature formation processes and structures formed thereby | Electricity | 0 | Active |
| US11855182B2 | Low-k gate spacer and methods for forming the same | Electricity | 0 | Active |
| US11342454B2 | Semiconductor device and method | Electricity | 0 | Active |
| US9824943B2 | Semiconductor structure and method for forming the same | Electricity | 0 | Active |
| US11295948B2 | Low-K feature formation processes and structures formed thereby | Electricity | 0 | Active |
| US11705327B2 | Low-k feature formation processes and structures formed thereby | Electricity | 0 | Active |
| US10847634B2 | Field effect transistor and method of forming the same | Electricity | 0 | Active |
| US11735430B2 | Fin field-effect transistor device and method | Electricity | 0 | Active |
| US10504898B2 | Fin field-effect transistor structure and method for forming the same | Electricity | 0 | Active |
| US10490650B2 | Low-k gate spacer and methods for forming the same | Electricity | 0 | Active |
| US10854713B2 | Method for forming trench structure of semiconductor device | Electricity | 0 | Active |
| US11450772B2 | Fin field-effect transistor device and method | Electricity | 0 | Active |
| US11942418B2 | Semiconductor structure and method for making the same | Electricity | 0 | Active |
| US9871100B2 | Trench structure of semiconductor device having uneven nitrogen distribution liner | Electricity | 0 | Active |
| US9991154B2 | Method for fabricating a fin field effect transistor and a shallow trench isolation | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.