Yan Wang
17Patents
2h-index
37Co-inventors
43Inventor score
Filing activity: Mar 29, 2017 → Feb 1, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10211108B2 | Gate structures and fabrication methods thereof | Electricity | 3 | Active |
| US10211062B2 | Semiconductor structures and fabrication methods thereof | Electricity | 2 | Active |
| US10374065B2 | Method and device for compound semiconductor fin structure | Electricity | 2 | Active |
| US10937896B2 | Device for compound semiconductor Fin structure | Electricity | 1 | Active |
| US10340271B2 | Semiconductor structure and fabrication method thereof | Electricity | 1 | Active |
| US10347578B2 | Semiconductor structure and fabrication method thereof | Electricity | 1 | Active |
| US10312163B2 | Method of improving surface smoothness of dummy gate | Electricity | 0 | Active |
| US10854467B2 | Semiconductor device and fabrication method thereof | Electricity | 0 | Active |
| US12390376B2 | Multi-layer absorbent cores and methods of manufacture | Human Necessities | 0 | Active |
| US11393685B2 | Semiconductor structure and fabrication method thereof | Electricity | 0 | Active |
| US11710780B2 | Semiconductor device fabrication method | Electricity | 0 | Active |
| US10325813B2 | Fin cut process and fin structure | Electricity | 0 | Active |
| US11081888B2 | Method, apparatus, and medium for calculating capacities of photovoltaic power stations | Emerging Cross-Sectional Technologies | 0 | Active |
| US10825690B2 | Semiconductor structures | Electricity | 0 | Active |
| US10373841B2 | Photomask manufacturing method | Electricity | 0 | Active |
| US11587794B2 | Semiconductor device and fabrication method thereof | Electricity | 0 | Active |
| US10522463B2 | Semiconductor structure | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.