Inventor · Bethel, CT, US

Ziyun Wang

40Patents
12h-index
56Co-inventors
84Inventor score

Filing activity: Mar 13, 2000 → Nov 1, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US7531679B2 Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride Electricity 33 Expired
US7713346B2 Composition and method for low temperature deposition of silicon-containing films Electricity 19 Active
US7786320B2 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride Electricity 18 Active
US7446217B2 Composition and method for low temperature deposition of silicon-containing films Electricity 17 Expired
US8853075B2 Method for forming a titanium-containing layer on a substrate using an atomic layer deposition (ALD) process Electricity 14 Active
US6623656B2 Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using same Chemistry; Metallurgy 14 Expired
US6417369B1 Pyrazolate copper complexes, and MOCVD of copper using same Chemistry; Metallurgy 13 Expired
US7887883B2 Composition and method for low temperature deposition of silicon-containing films Electricity 13 Active
US6440202B1 Pyrazolate copper complexes, and MOCVD of copper using same Chemistry; Metallurgy 13 Expired
US8236097B2 Composition and method for low temperature deposition of silicon-containing films Electricity 13 Active
US7579496B2 Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Chemistry; Metallurgy 12 Expired
US7910765B2 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride Electricity 12 Active
US7863203B2 Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Chemistry; Metallurgy 11 Active
US7108771B2 Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films Performing Operations; Transporting 11 Expired
US7601860B2 Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Electricity 10 Expired
US6639080B2 Pyrazolate copper complexes, and MOCVD of copper using same Chemistry; Metallurgy 10 Expired
US7084080B2 Silicon source reagent compositions, and method of making and using same for microelectronic device structure Electricity 9 Expired
US8802882B2 Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Electricity 9 Active
US7781605B2 Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Electricity 9 Active
US6767830B2 Br2SbCH3 a solid source ion implant and CVD precursor Electricity 6 Expired
US8242032B2 Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Chemistry; Metallurgy 5 Active
US9102693B2 Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Electricity 5 Active
US9085823B2 Method of forming a tantalum-containing layer on a substrate Chemistry; Metallurgy 2 Active
US11002802B2 Fault detection method for buck converter based on inverse kalman filter Electricity 2 Active
US8153833B2 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride Electricity 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.