Patent assignee · KR · COMPANY

Hyundai Microelectronics Co., Ltd.

20Patents
0Active
20Granted
31Portfolio score

Filing activity: Sep 18, 1997 → Mar 6, 2002

Most-cited patents

PatentTitleAreaCited byStatus
US6097635A Sensing circuit for programming/reading multilevel flash memory Physics 40 Expired
US6125064A CAS latency control circuit Physics 16 Expired
US6458627B1 Semiconductor chip package and method of fabricating same Electricity 10 Expired
US6104637A Apparatus for programming threshold voltage for non-volatile memory cell and method therefor Physics 10 Expired
US6192160A Hardware architectures for image dilation and erosion operations Physics 9 Expired
US6094389A Semiconductor memory apparatus having refresh test circuit Physics 9 Expired
US6104656A Sense amplifier control circuit in semiconductor memory Physics 8 Expired
US6358794B1 Capacitor of semiconductor device and method of fabricating the same Electricity 7 Expired
US6372116B1 Method of forming a conductive layer and an electroplating apparatus thereof Chemistry; Metallurgy 7 Expired
US6297091A Method for fabricating contact pad for semiconductor device Electricity 6 Expired
US6502214B1 Memory test circuit Physics 5 Expired
US6583054B2 Method for forming conductive line in semiconductor device Electricity 4 Expired
US6146932A Method for fabricating metal-oxide-semiconductor field effect transistor device Electricity 4 Expired
US6225820A Semiconductor device having improved input buffer circuit Electricity 4 Expired
US6664614B2 Lead frame and bottom lead semiconductor package using the lead frame Electricity 4 Expired
US6797135B2 Electroplating apparatus Chemistry; Metallurgy 2 Expired
US6265114A Method of generating mask data in fabricating semiconductor devices Physics 1 Expired
US6753564B2 Capacitor of semiconductor device and method of fabricating the same Electricity 1 Expired
US6340636B1 Method for forming metal line in semiconductor device Electricity 1 Expired
US6511890B2 Method of fabricating a semiconductor device Electricity 1 Expired

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.