Dan M. Mocuta
24Patents
8h-index
40Co-inventors
75Inventor score
Filing activity: Apr 19, 2002 → Jul 29, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6958286B2 | Method of preventing surface roughening during hydrogen prebake of SiGe substrates | Emerging Cross-Sectional Technologies | 234 | Expired |
| US6916698B2 | High performance CMOS device structure with mid-gap metal gate | Electricity | 133 | Expired |
| US7723750B2 | MOSFET with super-steep retrograded island | Electricity | 124 | Active |
| US7071103B2 | Chemical treatment to retard diffusion in a semiconductor overlayer | Electricity | 120 | Expired |
| US6762469B2 | High performance CMOS device structure with mid-gap metal gate | Electricity | 60 | Expired |
| US7268049B2 | Structure and method for manufacturing MOSFET with super-steep retrograded island | Electricity | 14 | Expired |
| US7550370B2 | Method of forming thin SGOI wafers with high relaxation and low stacking fault defect density | Electricity | 10 | Expired |
| US7691698B2 | Pseudomorphic Si/SiGe/Si body device with embedded SiGe source/drain | Electricity | 8 | Active |
| US9093275B2 | Multi-height multi-composition semiconductor fins | Electricity | 5 | Active |
| US7528027B1 | Structure and method for manufacturing device with ultra thin SOI at the tip of a V-shape channel | Electricity | 5 | Active |
| US7202132B2 | Protecting silicon germanium sidewall with silicon for strained silicon/silicon germanium MOSFETs | Electricity | 5 | Expired |
| US6749684B1 | Method for improving CVD film quality utilizing polysilicon getterer | Chemistry; Metallurgy | 4 | Expired |
| US7498602B2 | Protecting silicon germanium sidewall with silicon for strained silicon/silicon mosfets | Electricity | 4 | Active |
| US10720363B2 | Method of forming vertical transistor device | Electricity | 4 | Active |
| US8168971B2 | Pseudomorphic Si/SiGe/Si body device with embedded SiGe source/drain | Electricity | 1 | Active |
| US9443854B2 | FinFET with constrained source-drain epitaxial region | Electricity | 1 | Active |
| US9461050B2 | Self-aligned laterally extended strap for a dynamic random access memory cell | Electricity | 0 | Active |
| US9252215B2 | Constrained epitaxial source/drain regions on semiconductor-on-insulator finFET device | Electricity | 0 | Active |
| US9536879B2 | FinFET with constrained source-drain epitaxial region | Electricity | 0 | Active |
| US10522552B2 | Method of fabricating vertical transistor device | Electricity | 0 | Active |
| US9059194B2 | High-K and metal filled trench-type EDRAM capacitor with electrode depth and dimension control | Electricity | 0 | Active |
| US9673197B2 | FinFET with constrained source-drain epitaxial region | Electricity | 0 | Active |
| US9299780B2 | Constrained epitaxial source/drain regions on semiconductor-on-insulator finFET device | Electricity | 0 | Active |
| US11991877B2 | DRAM circuitry and method of forming DRAM circuitry | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.