Fang-Wei Lee
30Patents
2h-index
41Co-inventors
49Inventor score
Filing activity: Jul 24, 2018 → Apr 30, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11462471B2 | Middle-of-line interconnect structure and manufacturing method | Electricity | 3 | Active |
| US11227794B2 | Method for making self-aligned barrier for metal vias In-Situ during a metal halide pre-clean and associated interconnect structure | Electricity | 2 | Active |
| US11646234B2 | Method for FinFET fabrication and structure thereof | Electricity | 1 | Active |
| US11031291B2 | Semiconductor structure and method of forming the same | Electricity | 1 | Active |
| US11222794B2 | Semiconductor fabrication system embedded with effective baking module | Electricity | 0 | Active |
| US12402394B2 | Semiconductor structure | Electricity | 0 | Active |
| US12336252B2 | Inner spacer formation in multi-gate transistors | Electricity | 0 | Active |
| US11107904B2 | Inner spacer formation in multi-gate transistors | Electricity | 0 | Active |
| US11605728B2 | Semiconductor device structure with inner spacer layer | Electricity | 0 | Active |
| US12021125B2 | High selectivity etching with germanium-containing gases | Electricity | 0 | Active |
| US12033863B2 | Semiconductor fabrication system embedded with effective baking module | Electricity | 0 | Active |
| US12376337B2 | Air inner spacers | Electricity | 0 | Active |
| US12334435B2 | Middle-of-line interconnect structure and manufacturing method | Electricity | 0 | Active |
| US12009294B2 | Middle-of-line interconnect structure and manufacturing method | Electricity | 0 | Active |
| US11973129B2 | Semiconductor device structure with inner spacer layer and method for forming the same | Electricity | 0 | Active |
| US12218219B2 | Spacer structure for semiconductor device | Electricity | 0 | Active |
| US12389619B2 | Semiconductor device structure with inner spacer layer | Electricity | 0 | Active |
| US11201243B2 | Nanowire stack GAA device and methods for producing the same | Emerging Cross-Sectional Technologies | 0 | Active |
| US11373878B2 | Technique for semiconductor manufacturing | Electricity | 0 | Active |
| US12224210B2 | Method for FinFet fabrication and structure thereof | Electricity | 0 | Active |
| US11830928B2 | Inner spacer formation in multi-gate transistors | Electricity | 0 | Active |
| US11855192B2 | Semiconductor device and manufacturing method thereof | Electricity | 0 | Active |
| US11056393B2 | Method for FinFET fabrication and structure thereof | Electricity | 0 | Active |
| US12266538B2 | Method for manufacturing semiconductor device using etchant composition having high etching selectivity | Electricity | 0 | Active |
| US11972974B2 | Self-aligned barrier for metal vias | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.