Inventor · Rifu, JP

Hiroto Ohtake

25Patents
6h-index
42Co-inventors
69Inventor score

Filing activity: Jun 22, 1998 → Jun 1, 2018

Most-cited inventions

PatentTitleAreaCited byStatus
US10340123B2 Multi-frequency power modulation for etching high aspect ratio features Electricity 40 Active
US9087798B2 Etching method Electricity 38 Active
US6054063A Method for plasma treatment and apparatus for plasma treatment Electricity 13 Expired
US7701060B2 Wiring structure and method for manufacturing the same Electricity 12 Expired
US8664125B2 Highly selective spacer etch process with reduced sidewall spacer slimming Electricity 8 Active
US7999392B2 Multilayer wiring structure, semiconductor device, pattern transfer mask and method for manufacturing multilayer wiring structure Electricity 7 Active
US6972453B2 Method of manufacturing a semiconductor device capable of etching a multi-layer of organic films at a high selectivity Electricity 6 Expired
US7622808B2 Semiconductor device and having trench interconnection Electricity 5 Expired
US8278763B2 Semiconductor device Electricity 5 Active
US10529589B2 Method of plasma etching of silicon-containing organic film using sulfur-based chemistry Electricity 4 Active
US8043957B2 Semiconductor device, method for manufacturing semiconductor device and apparatus for manufacturing semiconductor Electricity 4 Active
US8592303B2 Wiring structure and method for manufacturing the same Electricity 2 Active
US9570312B2 Plasma etching method Electricity 1 Active
US9502537B2 Method of selectively removing a region formed of silicon oxide and plasma processing apparatus Electricity 1 Active
US9105585B2 Etching method Electricity 1 Active
US7482694B2 Semiconductor device and its manufacturing method Electricity 1 Expired
US9412607B2 Plasma etching method Electricity 1 Active
US8808562B2 Dry metal etching method Electricity 1 Active
US9305795B2 Plasma processing method Electricity 1 Active
US8803285B2 Semiconductor device capable of reducing interelectrode leak current and manufacturing method thereof Electricity 1 Active
US9373520B2 Multilayer film etching method and plasma processing apparatus Electricity 1 Active
US10381238B2 Process for performing self-limited etching of organic materials Electricity 0 Active
US10410873B2 Power modulation for etching high aspect ratio features Electricity 0 Active
US9034698B2 Semiconductor device manufacturing method Electricity 0 Active
US10115591B2 Selective SiARC removal Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.