Ismail Emesh
39Patents
13h-index
41Co-inventors
81Inventor score
Filing activity: Apr 30, 1992 → Oct 17, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5354712A | Method for forming interconnect structures for integrated circuits | Electricity | 327 | Expired |
| US5789303A | Method of adding on chip capacitors to an integrated circuit | Emerging Cross-Sectional Technologies | 147 | Expired |
| US5452178A | Structure and method of making a capacitor for an intergrated circuit | Electricity | 124 | Expired |
| US5563762A | Capacitor for an integrated circuit and method of formation thereof, and a method of adding on-chip capacitors to an integrated circuit | Emerging Cross-Sectional Technologies | 109 | Expired |
| US7449098B1 | Method for planar electroplating | Electricity | 86 | Expired |
| US5407698A | Deposition of tungsten | Electricity | 71 | Expired |
| US6736952B2 | Method and apparatus for electrochemical planarization of a workpiece | Electricity | 63 | Expired |
| US5330931A | Method of making a capacitor for an integrated circuit | Electricity | 62 | Expired |
| US5728603A | Method of forming a crystalline ferroelectric dielectric material for an integrated circuit | Electricity | 58 | Expired |
| US6066581A | Sol-gel precursor and method for formation of ferroelectric materials for integrated circuits | Electricity | 36 | Expired |
| US5358889A | Formation of ruthenium oxide for integrated circuits | Electricity | 34 | Expired |
| US6802955B2 | Method and apparatus for the electrochemical deposition and planarization of a material on a workpiece surface | Electricity | 29 | Expired |
| US6337032B1 | Sol-gel precursor and method for formation of ferroelectric materials for integrated circuits | Electricity | 22 | Expired |
| US6572755B2 | Method and apparatus for electrochemically depositing a material onto a workpiece surface | Electricity | 13 | Expired |
| US7297239B2 | Method and apparatus for the electrochemical deposition and planarization of a material on a workpiece surface | Electricity | 6 | Expired |
| US8357599B2 | Seed layer passivation | Electricity | 5 | Active |
| US7201828B2 | Planar plating apparatus | Electricity | 4 | Expired |
| US9768060B2 | Systems and methods for electrochemical deposition on a workpiece including removing contamination from seed layer surface prior to ECD | Electricity | 4 | Active |
| US7033464B2 | Apparatus for electrochemically depositing a material onto a workpiece surface | Electricity | 4 | Expired |
| US9245798B2 | Semiconductor reflow processing for high aspect ratio fill | Electricity | 4 | Active |
| US9425092B2 | Methods for producing interconnects in semiconductor devices | Electricity | 4 | Active |
| US6974525B2 | Method and apparatus for electrochemical planarization of a workpiece | Electricity | 2 | Expired |
| US9805976B2 | Co or Ni and Cu integration for small and large features in integrated circuits | Electricity | 2 | Active |
| US9496145B2 | Electrochemical plating methods | Electricity | 2 | Active |
| US10062607B2 | Methods for producing interconnects in semiconductor devices | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.