Inventor · Downingtown, PA, US

James A. Culp

50Patents
9h-index
86Co-inventors
77Inventor score

Filing activity: Jun 8, 2000 → Jun 6, 2016

Most-cited inventions

PatentTitleAreaCited byStatus
US6713791B2 T-RAM array having a planar cell structure and method for fabricating the same Electricity 34 Expired
US7536664B2 Physical design system and method Physics 32 Expired
US6429482B1 Halo-free non-rectifying contact on chip with halo source/drain diffusion Electricity 27 Expired
US7865864B2 Electrically driven optical proximity correction Physics 15 Active
US6541166B2 Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures Electricity 12 Expired
US6996797B1 Method for verification of resolution enhancement techniques and optical proximity correction in lithography Emerging Cross-Sectional Technologies 12 Expired
US7627836B2 OPC trimming for performance Physics 11 Expired
US6892365B2 Method for performing monte-carlo simulations to predict overlay failures in integrated circuit designs Physics 10 Expired
US7269808B2 Design verification Physics 10 Expired
US8473885B2 Physical design system and method Physics 7 Active
US6750109B2 Halo-free non-rectifying contact on chip with halo source/drain diffusion Electricity 7 Expired
US7890906B2 Method of laying out integrated circuit design based on known polysilicon perimeter densities of individual cells Physics 6 Active
US7900178B2 Integrated circuit (IC) design method, system and program product Physics 6 Active
US9311443B2 Correcting for stress induced pattern shifts in semiconductor manufacturing Physics 5 Active
US7975244B2 Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masks Physics 5 Active
US8176444B2 Analyzing multiple induced systematic and statistical layout dependent effects on circuit performance Physics 5 Active
US9311442B2 Net-voltage-aware optical proximity correction (OPC) Physics 4 Active
US9836570B1 Semiconductor layout generation Emerging Cross-Sectional Technologies 4 Active
US7503028B2 Multilayer OPC for design aware manufacturing Physics 4 Active
US9075106B2 Detecting chip alterations with light emission Physics 4 Active
US9455186B2 Selective local metal cap layer formation for improved electromigration behavior Electricity 4 Active
US7473648B2 Double exposure double resist layer process for forming gate patterns Electricity 4 Active
US7849433B2 Integrated circuit with uniform polysilicon perimeter density, method and design structure Physics 4 Active
US8239790B2 Methods and system for analysis and management of parametric yield Physics 3 Active
US7669175B2 Methodology to improve turnaround for integrated circuit design using geometrical hierarchy Emerging Cross-Sectional Technologies 3 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.