Inventor · San Jose, CA, US

Jeremiah T. Pender

24Patents
9h-index
39Co-inventors
71Inventor score

Filing activity: Jun 30, 2000 → Mar 24, 2016

Most-cited inventions

PatentTitleAreaCited byStatus
US7575007B2 Chamber recovery after opening barrier over copper Electricity 195 Active
US8980758B1 Methods for etching an etching stop layer utilizing a cyclical etching process Electricity 187 Active
US9165783B2 Method of patterning a low-k dielectric film Electricity 117 Active
US8748322B1 Silicon oxide recess etch Electricity 115 Active
US8802572B2 Method of patterning a low-k dielectric film Electricity 115 Active
US9543163B2 Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process Electricity 113 Active
US9478433B1 Cyclic spacer etching process with improved profile control Electricity 106 Active
US9093389B2 Method of patterning a silicon nitride dielectric film Electricity 103 Active
US6440864B1 Substrate cleaning process Electricity 51 Expired
US7620511B2 Method for determining plasma characteristics Electricity 9 Active
US7300597B2 Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material Electricity 8 Active
US7848898B2 Method for monitoring process drift using plasma characteristics Electricity 8 Active
US7309448B2 Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material Electricity 5 Expired
US8143138B2 Method for fabricating interconnect structures for semiconductor devices Electricity 4 Active
US7286948B1 Method for determining plasma characteristics Electricity 3 Active
US9721807B2 Cyclic spacer etching process with improved profile control Electricity 2 Active
US8932959B2 Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material Electricity 1 Active
US8314033B2 Method of patterning a low-k dielectric film Electricity 1 Active
US11302519B2 Method of patterning a low-k dielectric film Electricity 1 Active
US7440859B2 Method for determining plasma characteristics Electricity 1 Active
US8980754B2 Method of removing a photoresist from a low-k dielectric film Electricity 1 Active
US9299577B2 Methods for etching a dielectric barrier layer in a dual damascene structure Electricity 1 Active
US8647990B2 Method of patterning a low-K dielectric film Electricity 0 Active
US9514953B2 Methods for barrier layer removal Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.