Lars Heineck
40Patents
7h-index
74Co-inventors
72Inventor score
Filing activity: Apr 6, 1998 → Sep 19, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6342452B1 | Method of fabricating a Si3N4/polycide structure using a dielectric sacrificial layer as a mask | Electricity | 31 | Expired |
| US9881924B2 | Semiconductor memory device having coplanar digit line contacts and storage node contacts in memory array and method for fabricating the same | Electricity | 15 | Active |
| US8772848B2 | Circuit structures, memory circuitry, and methods | Electricity | 12 | Active |
| US8569831B2 | Integrated circuit arrays and semiconductor constructions | Electricity | 10 | Active |
| US6919255B2 | Semiconductor trench structure | Electricity | 10 | Expired |
| US7274060B2 | Memory cell array and method of forming the same | Electricity | 8 | Expired |
| US7094674B2 | Method for production of contacts on a wafer | Electricity | 7 | Expired |
| US10566332B2 | Semiconductor devices | Electricity | 7 | Active |
| US6423607B1 | Trench capacitor with insulation collar and corresponding fabrication method | Electricity | 7 | Expired |
| US5998254A | Method for creating a conductive connection between at least two zones of a first conductivity type | Electricity | 7 | Expired |
| US6281079A | MOS transistor in a single-transistor memory cell having a locally thickened gate oxide, and production process | Electricity | 6 | Expired |
| US6916721B2 | Method for fabricating a trench capacitor with an insulation collar | Electricity | 5 | Expired |
| US9691773B2 | Silicon buried digit line access device and method of forming the same | Electricity | 5 | Active |
| US7018781B2 | Method for fabricating a contact hole plane in a memory module | Electricity | 5 | Expired |
| US8361856B2 | Memory cells, arrays of memory cells, and methods of forming memory cells | Electricity | 5 | Active |
| US9385132B2 | Arrays of recessed access devices, methods of forming recessed access gate constructions, and methods of forming isolation gate constructions in the fabrication of recessed access devices | Electricity | 4 | Active |
| US7838928B2 | Word line to bit line spacing method and apparatus | Electricity | 4 | Active |
| US10163909B2 | Methods for fabricating a semiconductor memory device | Electricity | 4 | Active |
| US7012313B2 | MOS transistor in a single-transistor memory cell having a locally thickened gate oxide | Electricity | 3 | Expired |
| US9337201B2 | Memory cells, arrays of memory cells, and methods of forming memory cells | Electricity | 3 | Active |
| US11488981B2 | Array of vertical transistors and method used in forming an array of vertical transistors | Electricity | 2 | Active |
| US9012330B2 | Method for semiconductor cross pitch doubled patterning process | Electricity | 2 | Active |
| US9070584B2 | Buried digitline (BDL) access device and memory array | Electricity | 2 | Active |
| US8735267B1 | Buried word line structure and method of forming the same | Electricity | 2 | Active |
| US7087492B2 | Method for fabricating transistors of different conduction types and having different packing densities in a semiconductor substrate | Electricity | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.