Nafees Kabir
23Patents
2h-index
56Co-inventors
52Inventor score
Filing activity: Jun 28, 2018 → Oct 20, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11444024B2 | Subtractively patterned interconnect structures for integrated circuits | Electricity | 4 | Active |
| US11239156B2 | Planar slab vias for integrated circuit interconnects | Electricity | 3 | Active |
| US10665499B2 | Integrated circuit with airgaps to control capacitance | Electricity | 2 | Active |
| US11289421B2 | Methods and structures for improved electrical contact between bonded integrated circuit interfaces | Electricity | 1 | Active |
| US11462469B2 | Single mask lithography line end enhancement | Electricity | 1 | Active |
| US11784123B2 | Methods and structures for improved electrical contact between bonded integrated circuit interfaces | Electricity | 0 | Active |
| US11837644B2 | Contact over active gate structures with metal oxide-caped contacts to inhibit shorting | Electricity | 0 | Active |
| US12266729B2 | Angled etch to enable tin removal from selected sidewalls | Electricity | 0 | Active |
| US12341092B2 | Planar slab vias for integrated circuit interconnects | Electricity | 0 | Active |
| US11404307B2 | Interconnect structures and methods of fabrication | Electricity | 0 | Active |
| US12087836B2 | Contact over active gate structures with metal oxide-caped contacts to inhibit shorting | Electricity | 0 | Active |
| US12261114B2 | Metallization stacks with self-aligned staggered metal lines | Electricity | 0 | Active |
| US11404482B2 | Self-aligned repeatedly stackable 3D vertical RRAM | Electricity | 0 | Active |
| US11424160B2 | Self-aligned local interconnects | Electricity | 0 | Active |
| US12412838B2 | Integrated circuit structure with filled recesses | Electricity | 0 | Active |
| US11887887B2 | Interconnect structures and methods of fabrication | Electricity | 0 | Active |
| US12027458B2 | Subtractively patterned interconnect structures for integrated circuits | Electricity | 0 | Active |
| US12293913B1 | Directed self-assembly enabled subtractive metal patterning | Electricity | 0 | Active |
| US11646266B2 | Helmet structures for semiconductor interconnects | Electricity | 0 | Active |
| US12266527B1 | Directed self-assembly enabled patterning over metal layers using assisting features | Electricity | 0 | Active |
| US11610810B2 | Maskless air gap enabled by a single damascene process | Electricity | 0 | Active |
| US11342227B2 | Stacked transistor structures with asymmetrical terminal interconnects | Electricity | 0 | Active |
| US11594673B2 | Two terminal spin orbit memory devices and methods of fabrication | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.