Inventor · New York, NY, US

Vijay Narayanan

256Patents
19h-index
234Co-inventors
89Inventor score

Filing activity: Jul 5, 2001 → Feb 21, 2025

Most-cited inventions

PatentTitleAreaCited byStatus
US9748145B1 Semiconductor devices with varying threshold voltage and fabrication methods thereof Electricity 464 Active
US6921711B2 Method for forming metal replacement gate of high performance Electricity 119 Expired
US7488656B2 Removal of charged defects from metal oxide-gate stacks Electricity 73 Expired
US6982230B2 Deposition of hafnium oxide and/or zirconium oxide and fabrication of passivated electronic structures Electricity 65 Expired
US9997519B1 Dual channel structures with multiple threshold voltages Electricity 61 Active
US7105889B2 Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high k dielectrics Electricity 61 Expired
US7855105B1 Planar and non-planar CMOS devices with multiple tuned threshold voltages Electricity 60 Active
US7242055B2 Nitrogen-containing field effect transistor gate stack containing a threshold voltage control layer formed via deposition of a metal oxide Electricity 38 Expired
US7432567B2 Metal gate CMOS with at least a single gate metal and dual gate dielectrics Electricity 37 Active
US6852575B2 Method of forming lattice-matched structure on silicon and structure formed thereby Electricity 35 Expired
US7696036B2 CMOS transistors with differential oxygen content high-k dielectrics Electricity 26 Active
US7479683B2 Selective implementation of barrier layers to achieve threshold voltage control in CMOS device fabrication with high-k dielectrics Electricity 25 Expired
US7071122B2 Field effect transistor with etched-back gate dielectric Electricity 25 Expired
US7989902B2 Scavenging metal stack for a high-k gate dielectric Electricity 24 Active
US7718496B2 Techniques for enabling multiple Vt devices using high-K metal gate stacks Electricity 24 Active
US7838908B2 Semiconductor device having dual metal gates and method of manufacture Electricity 23 Active
US7870151B2 Fast accurate fuzzy matching Physics 22 Active
US8110467B2 Multiple Vt field-effect transistor devices Electricity 21 Active
US7863126B2 Fabrication of a CMOS structure with a high-k dielectric layer oxidizing an aluminum layer in PFET region Electricity 20 Active
US9793397B1 Ferroelectric gate dielectric with scaled interfacial layer for steep sub-threshold slope field-effect transistor Electricity 18 Active
US8741713B2 Reliable physical unclonable function for device authentication Electricity 18 Active
US7655994B2 Low threshold voltage semiconductor device with dual threshold voltage control means Electricity 17 Expired
US7067422B2 Method of forming a tantalum-containing gate electrode structure Electricity 17 Expired
US8420473B2 Replacement gate devices with barrier metal for simultaneous processing Electricity 16 Active
US7750418B2 Introduction of metal impurity to change workfunction of conductive electrodes Electricity 16 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.