Wei Long
49Patents
11h-index
46Co-inventors
75Inventor score
Filing activity: Sep 30, 1998 → Sep 11, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6225669A | Non-uniform gate/dielectric field effect transistor | Electricity | 72 | Expired |
| US6437404B1 | Semiconductor-on-insulator transistor with recessed source and drain | Electricity | 34 | Expired |
| US6608352B1 | Determination of thermal resistance for field effect transistor formed in SOI technology | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6168999A | Method for fabricating high-performance submicron mosfet with lateral asymmetric channel and a lightly doped drain | Electricity | 23 | Expired |
| US6744101B2 | Non-uniform gate/dielectric field effect transistor | Electricity | 22 | Expired |
| US6391767B1 | Dual silicide process to reduce gate resistance | Electricity | 18 | Expired |
| US6417556B1 | High K dielectric de-coupling capacitor embedded in backend interconnect | Electricity | 16 | Expired |
| US6153534A | Method for fabricating a dual material gate of a short channel field effect transistor | Electricity | 15 | Expired |
| US6069485A | C-V method to extract lateral channel doping profiles of MOSFETs | Electricity | 13 | Expired |
| US6420770B1 | STI (Shallow Trench Isolation) structures for minimizing leakage current through drain and source silicides | Electricity | 13 | Expired |
| US6306710A | Fabrication of a gate structures having a longer length toward the top for formation of a rectangular shaped spacer | Electricity | 12 | Expired |
| US6166558A | Method for measuring gate length and drain/source gate overlap | Electricity | 11 | Expired |
| US6790750B1 | Semiconductor-on-insulator body-source contact and method | Electricity | 9 | Expired |
| US6275972A | Method for accurate channel-length extraction in MOSFETs | Physics | 8 | Expired |
| US6255219A | Method for fabricating high-performance submicron MOSFET with lateral asymmetric channel | Electricity | 8 | Expired |
| US6323099A | High k interconnect de-coupling capacitor with damascene process | Electricity | 8 | Expired |
| US6274420A | Sti (shallow trench isolation) structures for minimizing leakage current through drain and source silicides | Electricity | 8 | Expired |
| US6441434B1 | Semiconductor-on-insulator body-source contact and method | Electricity | 7 | Expired |
| US11403869B2 | Optical fingerprint identification apparatus and electronic device | Electricity | 6 | Active |
| US6373103B1 | Semiconductor-on-insulator body-source contact using additional drain-side spacer, and method | Electricity | 6 | Expired |
| US6525381B1 | Semiconductor-on-insulator body-source contact using shallow-doped source, and method | Electricity | 6 | Expired |
| US6423604B1 | Determination of thermal resistance for field effect transistor formed in SOI technology | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6169302A | Determination of parasitic capacitance between the gate and drain/source local interconnect of a field effect transistor | Electricity | 4 | Expired |
| US10139938B2 | Mobile terminal | Physics | 4 | Active |
| US10784298B2 | Optical module, fabrication method thereof, and terminal device using the same | Electricity | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.