Yahru Cheng
27Patents
2h-index
34Co-inventors
49Inventor score
Filing activity: Feb 26, 2018 → Apr 29, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11705332B2 | Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern | Electricity | 5 | Active |
| US11029602B2 | Photoresist composition and method of forming photoresist pattern | Physics | 2 | Active |
| US11822237B2 | Method of manufacturing a semiconductor device | Electricity | 2 | Active |
| US10768527B2 | Resist solvents for photolithography applications | Electricity | 1 | Active |
| US11901189B2 | Ambient controlled two-step thermal treatment for spin-on coating layer planarization | Electricity | 1 | Active |
| US10529552B2 | Method for manufacturing a semiconductor device and a coating material | Electricity | 1 | Active |
| US11003082B2 | Method for forming semiconductor structure | Electricity | 1 | Active |
| US12002675B2 | Photoresist layer outgassing prevention | Electricity | 1 | Active |
| US12271113B2 | Method of manufacturing a semiconductor device | Physics | 0 | Active |
| US12094952B2 | Air spacer formation with a spin-on dielectric material | Emerging Cross-Sectional Technologies | 0 | Active |
| US12222643B2 | Method of manufacturing a semiconductor device and pattern formation method | Electricity | 0 | Active |
| US12013641B2 | Method of reducing undesired light influence in extreme ultraviolet exposure | Physics | 0 | Active |
| US12159787B2 | Method of manufacturing a semiconductor device and pattern formation method | Chemistry; Metallurgy | 0 | Active |
| US12272554B2 | Method of manufacturing a semiconductor device | Electricity | 0 | Active |
| US10770293B2 | Method for manufacturing a semiconductor device | Electricity | 0 | Active |
| US12374548B2 | Photoresist layer outgassing prevention | Electricity | 0 | Active |
| US12135501B2 | Method of manufacturing a semiconductor device | Electricity | 0 | Active |
| US11626482B2 | Air spacer formation with a spin-on dielectric material | Emerging Cross-Sectional Technologies | 0 | Active |
| US11784046B2 | Method of manufacturing a semiconductor device | Electricity | 0 | Active |
| US11942322B2 | Method of manufacturing semiconductor devices and pattern formation method | Electricity | 0 | Active |
| US12106961B2 | Humidity control or aqueous treatment for EUV metallic resist | Electricity | 0 | Active |
| US11971657B2 | Photoresist developer and method of developing photoresist | Electricity | 0 | Active |
| US12354874B2 | Method of manufacturing semiconductor devices and pattern formation method | Electricity | 0 | Active |
| US12087592B2 | Ambient controlled two-step thermal treatment for spin-on coating layer planarization | Electricity | 0 | Active |
| US11703762B2 | Method of reducing undesired light influence in extreme ultraviolet exposure | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.