Yasuto Ishida
17Patents
3h-index
16Co-inventors
57Inventor score
Filing activity: Feb 28, 1974 → Aug 4, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10876073B2 | Composition for surface treatment, and method for surface treatment using the same | Chemistry; Metallurgy | 13 | Active |
| US9486892B2 | Polishing composition | Electricity | 8 | Active |
| US4014941A | Method of producing .alpha.,.beta.-unsaturated ether | Chemistry; Metallurgy | 3 | Expired |
| US10781410B2 | Composition for surface treatment and method for surface treatment using the same | Chemistry; Metallurgy | 1 | Active |
| US10876082B2 | Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate | Chemistry; Metallurgy | 1 | Active |
| US11466234B2 | Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate | Chemistry; Metallurgy | 0 | Active |
| US8703007B2 | Polishing composition and polishing method using the same | Electricity | 0 | Active |
| US10954479B2 | Composition for surface treatment and surface treatment method using the same | Electricity | 0 | Active |
| US11162057B2 | Composition for surface treatment, method for producing composition for surface treatment, surface treatment method, and method for producing semiconductor substrate | Chemistry; Metallurgy | 0 | Active |
| US11702570B2 | Polishing composition | Chemistry; Metallurgy | 0 | Active |
| US10916435B2 | Surface treatment composition, method of producing surface treatment composition, method of treating surface, and method of producing semiconductor substrate | Chemistry; Metallurgy | 0 | Active |
| US12249513B2 | Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment | Electricity | 0 | Active |
| US10093834B2 | Polishing composition and polishing method | Electricity | 0 | Active |
| US11203731B2 | Composition for surface treatment and method of producing the same, surface treatment method, and method of producing semiconductor substrate | Chemistry; Metallurgy | 0 | Active |
| US11692137B2 | Intermediate raw material, and polishing composition and composition for surface treatment using the same | Electricity | 0 | Active |
| US11028340B2 | Composition for surface treatment, method for producing the same, surface treatment method using composition for surface treatment, and method for producing semiconductor substrate | Electricity | 0 | Active |
| US12312499B2 | Surface treatment method, method for producing semiconductor substrate including the surface treatment method, composition for surface treatment, and system for producing semiconductor substrate including the composition for surface treatment | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.