Bruce B. Doris
767Patents
32h-index
277Co-inventors
93Inventor score
Filing activity: Dec 27, 1993 → Aug 22, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8969934B1 | Gate-all-around nanowire MOSFET and method of formation | Electricity | 308 | Active |
| US7459752B2 | Ultra thin body fully-depleted SOI MOSFETs | Electricity | 274 | Active |
| US6977194B2 | Structure and method to improve channel mobility by gate electrode stress modification | Electricity | 180 | Expired |
| US7250658B2 | Hybrid planar and FinFET CMOS devices | Electricity | 156 | Expired |
| US6717216B1 | SOI based field effect transistor having a compressive film in undercut area under the channel and a method of making the device | Electricity | 148 | Expired |
| US6825529B2 | Stress inducing spacers | Electricity | 148 | Expired |
| US9362355B1 | Nanosheet MOSFET with full-height air-gap spacer | Electricity | 145 | Active |
| US7348629B2 | Metal gated ultra short MOSFET devices | Electricity | 120 | Expired |
| US7678638B2 | Metal gated ultra short MOSFET devices | Electricity | 119 | Active |
| US7494861B2 | Method for metal gated ultra short MOSFET devices | Electricity | 119 | Active |
| US6974981B2 | Isolation structures for imposing stress patterns | Electricity | 105 | Expired |
| US7993999B2 | High-K/metal gate CMOS finFET with improved pFET threshold voltage | Electricity | 100 | Active |
| US6790733B1 | Preserving TEOS hard mask using COR for raised source-drain including removable/disposable spacer | Emerging Cross-Sectional Technologies | 97 | Expired |
| US7224033B2 | Structure and method for manufacturing strained FINFET | Electricity | 94 | Expired |
| US7015082B2 | High mobility CMOS circuits | Electricity | 88 | Expired |
| US7329923B2 | High-performance CMOS devices on hybrid crystal oriented substrates | Electricity | 85 | Expired |
| US7247912B2 | Structures and methods for making strained MOSFETs | Electricity | 73 | Expired |
| US7291886B2 | Hybrid substrate technology for high-mobility planar and multiple-gate MOSFETs | Electricity | 65 | Expired |
| US6911383B2 | Hybrid planar and finFET CMOS devices | Electricity | 62 | Expired |
| US8169025B2 | Strained CMOS device, circuit and method of fabrication | Electricity | 57 | Active |
| US6780694B2 | MOS transistor | Electricity | 54 | Expired |
| US7388259B2 | Strained finFET CMOS device structures | Electricity | 54 | Expired |
| US7091566B2 | Dual gate FinFet | Electricity | 53 | Expired |
| US8796093B1 | Doping of FinFET structures | Electricity | 52 | Active |
| US6939751B2 | Method and manufacture of thin silicon on insulator (SOI) with recessed channel | Electricity | 50 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.