Chun Yu Wong
21Patents
4h-index
42Co-inventors
55Inventor score
Filing activity: Apr 23, 2012 → Oct 9, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10475791B1 | Transistor fins with different thickness gate dielectric | Electricity | 7 | Active |
| US8637993B2 | 3D integrated circuit system with connecting via structure and method for forming the same | Electricity | 6 | Active |
| US9706832B2 | Dispensers and applicator heads therefor | Human Necessities | 5 | Active |
| US9508795B2 | Methods of fabricating nanowire structures | Electricity | 4 | Active |
| US10418285B1 | Fin field-effect transistor (FinFET) and method of production thereof | Electricity | 3 | Active |
| US10804199B2 | Self-aligned chamferless interconnect structures of semiconductor devices | Electricity | 2 | Active |
| US9245790B2 | Integrated circuits and methods of forming the same with multiple embedded interconnect connection to same through-semiconductor via | Electricity | 2 | Active |
| US11018221B2 | Air gap regions of a semiconductor device | Electricity | 1 | Active |
| US10510662B2 | Vertically oriented metal silicide containing e-fuse device and methods of making same | Electricity | 1 | Active |
| US9601428B2 | Semiconductor fuses with nanowire fuse links and fabrication methods thereof | Electricity | 1 | Active |
| US10332834B2 | Semiconductor fuses with nanowire fuse links and fabrication methods thereof | Electricity | 0 | Active |
| US10879171B2 | Vertically oriented metal silicide containing e-fuse device | Electricity | 0 | Active |
| US9761481B2 | Integrated circuits and methods of forming the same with metal layer connection to through-semiconductor via | Electricity | 0 | Active |
| US10910276B1 | STI structure with liner along lower portion of longitudinal sides of active region, and related FET and method | Electricity | 0 | Active |
| US10461029B2 | Hybrid material electrically programmable fuse and methods of forming | Electricity | 0 | Active |
| US10439026B2 | Fins with single diffusion break facet improvement using epitaxial insulator | Electricity | 0 | Active |
| US10468481B2 | Self-aligned single diffusion break isolation with reduction of strain loss | Electricity | 0 | Active |
| US10043764B2 | Through silicon via device having low stress, thin film gaps and methods for forming the same | Electricity | 0 | Active |
| US9455188B2 | Through silicon via device having low stress, thin film gaps and methods for forming the same | Electricity | 0 | Active |
| US11171036B2 | Preventing dielectric void over trench isolation region | Electricity | 0 | Active |
| US10636894B2 | Fin-type transistors with spacers on the gates | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.