Cory E. Weber
48Patents
8h-index
71Co-inventors
78Inventor score
Filing activity: May 12, 1999 → Jan 10, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7226843B2 | Indium-boron dual halo MOSFET | Electricity | 128 | Expired |
| US7566605B2 | Epitaxial silicon germanium for reduced contact resistance in field-effect transistors | Electricity | 13 | Active |
| US6800887B1 | Nitrogen controlled growth of dislocation loop in stress enhanced transistor | Electricity | 12 | Expired |
| US8193049B2 | Methods of channel stress engineering and structures formed thereby | Electricity | 12 | Active |
| US7226824B2 | Nitrogen controlled growth of dislocation loop in stress enhanced transistor | Electricity | 9 | Expired |
| US10304946B2 | Vertical integration scheme and circuit elements architecture for area scaling of semiconductor devices | Electricity | 9 | Active |
| US7851291B2 | Epitaxial silicon germanium for reduced contact resistance in field-effect transistors | Electricity | 8 | Active |
| US9583487B2 | Semiconductor device having metallic source and drain regions | Electricity | 8 | Active |
| US7187057B2 | Nitrogen controlled growth of dislocation loop in stress enhanced transistor | Electricity | 7 | Expired |
| US10411090B2 | Hybrid trigate and nanowire CMOS device architecture | Electricity | 6 | Active |
| US6410359B1 | Reduced leakage trench isolation | Electricity | 6 | Expired |
| US6215165A | Reduced leakage trench isolation | Electricity | 5 | Expired |
| US6838329B2 | High concentration indium fluorine retrograde wells | Electricity | 4 | Expired |
| US8779477B2 | Enhanced dislocation stress transistor | Electricity | 4 | Active |
| US7129533B2 | High concentration indium fluorine retrograde wells | Electricity | 3 | Expired |
| US10483385B2 | Nanowire structures having wrap-around contacts | Electricity | 3 | Active |
| US10600810B2 | Backside fin recess control with multi-hsi option | Electricity | 2 | Active |
| US11335789B2 | Channel structures for thin-film transistors | Electricity | 1 | Active |
| US11990476B2 | Semiconductor nanowire device having (111)-plane channel sidewalls | Electricity | 0 | Active |
| US11398478B2 | Semiconductor nanowire device having (111)-plane channel sidewalls | Electricity | 0 | Active |
| US12310044B2 | Vertical integration scheme and circuit elements architecture for area scaling of semiconductor devices | Electricity | 0 | Active |
| US10991696B2 | Vertically stacked devices with self-aligned regions formed by direct self assembly (DSA) processing | Electricity | 0 | Active |
| US12199098B2 | Fin doping and integrated circuit structures resulting therefrom | Electricity | 0 | Active |
| US9231076B2 | Enhanced dislocation stress transistor | Electricity | 0 | Active |
| US11342432B2 | Gate-all-around integrated circuit structures having insulator fin on insulator substrate | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.