Inventor · Radebeul, DE

Frank Koschinsky

16Patents
4h-index
20Co-inventors
56Inventor score

Filing activity: Apr 11, 2002 → Sep 6, 2016

Most-cited inventions

PatentTitleAreaCited byStatus
US6613660B2 Metallization process sequence for a barrier metal layer Electricity 31 Expired
US6964874B2 Void formation monitoring in a damascene process Electricity 23 Expired
US9177858B1 Methods for fabricating integrated circuits including barrier layers for interconnect structures Electricity 23 Active
US8053354B2 Reduced wafer warpage in semiconductors by stress engineering in the metallization system Emerging Cross-Sectional Technologies 6 Active
US8163571B2 Multi-step deposition control Electricity 3 Active
US8585877B2 Multi-step deposition control Electricity 1 Active
US9147618B2 Method for detecting defects in a diffusion barrier layer Electricity 1 Active
US8323989B2 Test system and method of reducing damage in seed layers in metallization systems of semiconductor devices Electricity 1 Active
US7820536B2 Method for removing a passivation layer prior to depositing a barrier layer in a copper metallization layer Electricity 1 Active
US9177826B2 Methods of forming metal nitride materials Electricity 1 Active
US8039400B2 Reducing contamination of semiconductor substrates during BEOL processing by performing a deposition/etch cycle during barrier deposition Emerging Cross-Sectional Technologies 1 Active
US8058081B2 Method of testing an integrity of a material layer in a semiconductor structure Electricity 0 Active
US6716650B2 Interface void monitoring in a damascene process Electricity 0 Expired
US10090195B2 Method including a formation of a diffusion barrier and semiconductor structure including a diffusion barrier Electricity 0 Active
US7063091B2 Method for cleaning the surface of a substrate Electricity 0 Expired
US9171754B2 Method including an etching of a portion of an interlayer dielectric in a semiconductor structure, a degas process and a preclean process Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.