Jong-Jan Lee
167Patents
22h-index
45Co-inventors
90Inventor score
Filing activity: Mar 7, 1997 → Jan 8, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7115945B2 | Strained silicon fin structure | Electricity | 321 | Expired |
| US7419844B2 | Real-time CMOS imager having stacked photodiodes fabricated on SOI wafer | Electricity | 263 | Active |
| US7800148B2 | CMOS active pixel sensor | Electricity | 218 | Active |
| US7045401B2 | Strained silicon finFET device | Electricity | 170 | Expired |
| US6562703B1 | Molecular hydrogen implantation method for forming a relaxed silicon germanium layer with high germanium content | Emerging Cross-Sectional Technologies | 77 | Expired |
| US7323349B2 | Self-aligned cross point resistor memory array | Electricity | 58 | Active |
| US9825202B2 | Display with surface mount emissive elements | Electricity | 55 | Active |
| US7378286B2 | Semiconductive metal oxide thin film ferroelectric memory transistor | Electricity | 52 | Expired |
| US6703293B2 | Implantation at elevated temperatures for amorphization re-crystallization of Si1-xGex films on silicon substrates | Emerging Cross-Sectional Technologies | 41 | Expired |
| US7015147B2 | Fabrication of silicon-on-nothing (SON) MOSFET fabrication using selective etching of Si1-xGex layer | Electricity | 40 | Expired |
| US6583000B1 | Process integration of Si1-xGex CMOS with Si1-xGex relaxation after STI formation | Electricity | 40 | Expired |
| US6767802B1 | Methods of making relaxed silicon-germanium on insulator via layer transfer | Electricity | 34 | Expired |
| US7608874B2 | Fully isolated photodiode stack | Electricity | 33 | Active |
| US6825086B2 | Strained-silicon channel CMOS with sacrificial shallow trench isolation oxide liner | Electricity | 31 | Expired |
| US7008813B1 | Epitaxial growth of germanium photodetector for CMOS imagers | Emerging Cross-Sectional Technologies | 31 | Expired |
| US5962884A | Single transistor ferroelectric memory cell with asymmetrical ferroelectric polarization and method of making the same | Physics | 30 | Expired |
| US7078298B2 | Silicon-on-nothing fabrication process | Electricity | 30 | Expired |
| US6992025B2 | Strained silicon on insulator from film transfer and relaxation by hydrogen implantation | Electricity | 27 | Expired |
| US5731608A | One transistor ferroelectric memory cell and method of making the same | Physics | 27 | Expired |
| US5907762A | Method of manufacture of single transistor ferroelectric memory cell using chemical-mechanical polishing | Electricity | 26 | Expired |
| US7906825B2 | Ge imager for short wavelength infrared | Electricity | 22 | Active |
| US6903384B2 | System and method for isolating silicon germanium dislocation regions in strained-silicon CMOS applications | Electricity | 22 | Expired |
| US5910673A | Locos MOS device for ESD protection | Emerging Cross-Sectional Technologies | 22 | Expired |
| US5891782A | Method for fabricating an asymmetric channel doped MOS structure | Electricity | 21 | Expired |
| US7186611B2 | High-density germanium-on-insulator photodiode array | Emerging Cross-Sectional Technologies | 20 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.