Inventor · Tigard, OR, US

Keith Fox

20Patents
9h-index
36Co-inventors
75Inventor score

Filing activity: May 18, 2004 → Jul 13, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US8591659B1 Plasma clean method for deposition chamber Electricity 518 Active
US7622400B1 Method for improving mechanical properties of low dielectric constant materials Electricity 32 Expired
US8124522B1 Reducing UV and dielectric diffusion barrier interaction through the modulation of optical properties Electricity 26 Active
US8173537B1 Methods for reducing UV and dielectric diffusion barrier interaction Electricity 25 Active
US8709551B2 Smooth silicon-containing films Electricity 21 Active
US7695765B1 Methods for producing low-stress carbon-doped oxide films with improved integration properties Electricity 18 Active
US8741394B2 In-situ deposition of film stacks Electricity 15 Active
US8563414B1 Methods for forming conductive carbon films by PECVD Chemistry; Metallurgy 13 Active
US8895415B1 Tensile stressed doped amorphous silicon Electricity 10 Active
US9028924B2 In-situ deposition of film stacks Electricity 6 Active
US9117668B2 PECVD deposition of smooth silicon films Electricity 5 Active
US10214816B2 PECVD apparatus for in-situ deposition of film stacks Electricity 4 Active
US9165788B2 Post-deposition soft annealing Electricity 4 Active
US11278141B2 Garment and hood hanger Human Necessities 1 Active
US11746420B2 PECVD apparatus for in-situ deposition of film stacks Electricity 1 Active
US10358717B2 Method for depositing high deposition rate, thick tetraethyl orthosilicate film with low compressive stress, high film stability and low shrinkage Electricity 0 Active
US12385138B2 Plasma-enhanced deposition of film stacks Electricity 0 Active
US10161034B2 Rapid chamber clean using concurrent in-situ and remote plasma sources Electricity 0 Active
US12341002B2 Low stress films for advanced semiconductor applications Electricity 0 Active
US9388491B2 Method for deposition of conformal films with catalysis assisted low temperature CVD Chemistry; Metallurgy 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.