Zhaowei Jia
25Patents
2h-index
19Co-inventors
50Inventor score
Filing activity: Aug 20, 2008 → Mar 9, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8598039B2 | Barrier layer removal method and apparatus | Electricity | 7 | Active |
| US11141762B2 | System for cleaning semiconductor wafers | Physics | 2 | Active |
| US9496172B2 | Method for forming interconnection structures | Electricity | 2 | Active |
| US9595457B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 1 | Active |
| US9492852B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 1 | Active |
| US11581205B2 | Methods and system for cleaning semiconductor wafers | Electricity | 1 | Active |
| US11257667B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 1 | Active |
| US11037804B2 | Methods and apparatus for cleaning substrates | Emerging Cross-Sectional Technologies | 1 | Active |
| US10453743B2 | Barrier layer removal method and semiconductor structure forming method | Electricity | 1 | Active |
| US10910244B2 | Methods and system for cleaning semiconductor wafers | Electricity | 1 | Active |
| US10615073B2 | Method for removing barrier layer for minimizing sidewall recess | Electricity | 0 | Active |
| US11926920B2 | Electroplating apparatus and electroplating method | Electricity | 0 | Active |
| US11859303B2 | Plating apparatus | Chemistry; Metallurgy | 0 | Active |
| US9633833B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 0 | Active |
| US11848217B2 | Methods and apparatus for cleaning substrates | Emerging Cross-Sectional Technologies | 0 | Active |
| US11008669B2 | Apparatus for holding a substrate | Electricity | 0 | Active |
| US11752529B2 | Method for cleaning semiconductor wafers | Physics | 0 | Active |
| US11967497B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 0 | Active |
| US10217662B2 | Method for processing interconnection structure for minimizing barrier sidewall recess | Electricity | 0 | Active |
| US11103898B2 | Methods and apparatus for cleaning substrates | Performing Operations; Transporting | 0 | Active |
| US11633765B2 | System for cleaning semiconductor wafers | Physics | 0 | Active |
| US10020208B2 | Methods and apparatus for cleaning semiconductor wafers | Electricity | 0 | Active |
| US11469134B2 | Plating chuck | Electricity | 0 | Active |
| US11911808B2 | System for cleaning semiconductor wafers | Physics | 0 | Active |
| US11638937B2 | Methods and apparatus for cleaning substrates | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.