MEARS TECHNOLOGIES, INC.
29Patents
22Active
29Granted
53Portfolio score
Filing activity: Sep 3, 2004 → Nov 21, 2014 · 20 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7781827B2 | Semiconductor device with a vertical MOSFET including a superlattice and related methods | Electricity | 131 | Active |
| US7514328B2 | Method for making a semiconductor device including shallow trench isolation (STI) regions with a superlattice therebetween | Electricity | 120 | Active |
| US7517702B2 | Method for making an electronic device including a poled superlattice having a net electrical dipole moment | Electricity | 117 | Active |
| US7446002B2 | Method for making a semiconductor device comprising a superlattice dielectric interface layer | Electricity | 115 | Expired |
| US7531828B2 | Semiconductor device including a strained superlattice between at least one pair of spaced apart stress regions | Electricity | 112 | Active |
| US7612366B2 | Semiconductor device including a strained superlattice layer above a stress layer | Electricity | 112 | Active |
| US7531829B2 | Semiconductor device including regions of band-engineered semiconductor superlattice to reduce device-on resistance | Electricity | 111 | Active |
| US7598515B2 | Semiconductor device including a strained superlattice and overlying stress layer and related methods | Electricity | 111 | Active |
| US7625767B2 | Methods of making spintronic devices with constrained spintronic dopant | Electricity | 110 | Active |
| US7880161B2 | Multiple-wavelength opto-electronic device including a superlattice | Emerging Cross-Sectional Technologies | 109 | Active |
| US7436026B2 | Semiconductor device comprising a superlattice channel vertically stepped above source and drain regions | Electricity | 109 | Expired |
| US7700447B2 | Method for making a semiconductor device comprising a lattice matching layer | Electricity | 109 | Active |
| US7928425B2 | Semiconductor device including a metal-to-semiconductor superlattice interface layer and related methods | Electricity | 108 | Active |
| US7659539B2 | Semiconductor device including a floating gate memory cell with a superlattice channel | Electricity | 108 | Active |
| US7303948B2 | Semiconductor device including MOSFET having band-engineered superlattice | Electricity | 107 | Expired |
| US7432524B2 | Integrated circuit comprising an active optical device having an energy band engineered superlattice | Electricity | 107 | Expired |
| US7586116B2 | Semiconductor device having a semiconductor-on-insulator configuration and a superlattice | Electricity | 107 | Active |
| US7446334B2 | Electronic device comprising active optical devices with an energy band engineered superlattice | Electricity | 107 | Expired |
| US7435988B2 | Semiconductor device including a MOSFET having a band-engineered superlattice with a semiconductor cap layer providing a channel | Electricity | 107 | Expired |
| US7491587B2 | Method for making a semiconductor device having a semiconductor-on-insulator (SOI) configuration and including a superlattice on a thin semiconductor layer | Electricity | 107 | Active |
| US7531850B2 | Semiconductor device including a memory cell with a negative differential resistance (NDR) device | Electricity | 106 | Active |
| US7863066B2 | Method for making a multiple-wavelength opto-electronic device including a superlattice | Emerging Cross-Sectional Technologies | 106 | Active |
| US8389974B2 | Multiple-wavelength opto-electronic device including a superlattice | Emerging Cross-Sectional Technologies | 106 | Active |
| US7718996B2 | Semiconductor device comprising a lattice matching layer | Electricity | 106 | Active |
| US7812339B2 | Method for making a semiconductor device including shallow trench isolation (STI) regions with maskless superlattice deposition following STI formation and related structures | Electricity | 106 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.