Balasubramanian S. Pranatharthi Haran
23Patents
6h-index
43Co-inventors
65Inventor score
Filing activity: Sep 7, 2004 → Aug 14, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8772168B2 | Formation of the dielectric cap layer for a replacement gate structure | Electricity | 25 | Active |
| US9741609B1 | Middle of line cobalt interconnection | Electricity | 15 | Active |
| US8101518B2 | Method and process for forming a self-aligned silicide contact | Electricity | 10 | Active |
| US7544610B2 | Method and process for forming a self-aligned silicide contact | Electricity | 9 | Expired |
| US8957465B2 | Formation of the dielectric cap layer for a replacement gate structure | Electricity | 7 | Active |
| US9455254B2 | Methods of forming a combined gate and source/drain contact structure and the resulting device | Electricity | 7 | Active |
| US10497612B2 | Methods of forming contact structures on integrated circuit products | Electricity | 4 | Active |
| US7501345B1 | Selective silicide formation by electrodeposit displacement reaction | Electricity | 4 | Active |
| US7914970B2 | Mixed lithography with dual resist and a single pattern transfer | Emerging Cross-Sectional Technologies | 4 | Active |
| US8698318B2 | Superfilled metal contact vias for semiconductor devices | Electricity | 4 | Active |
| US10600638B2 | Nanosheet transistors with sharp junctions | Electricity | 3 | Active |
| US11133217B1 | Late gate cut with optimized contact trench size | Electricity | 2 | Active |
| US11164782B2 | Self-aligned gate contact compatible cross couple contact formation | Electricity | 2 | Active |
| US8334090B2 | Mixed lithography with dual resist and a single pattern transfer | Emerging Cross-Sectional Technologies | 2 | Active |
| US9704991B1 | Gate height and spacer uniformity | Electricity | 1 | Active |
| US11171054B2 | Selective deposition with SAM for fully aligned via | Electricity | 0 | Active |
| US11355633B2 | Vertical field effect transistor with bottom source-drain region | Electricity | 0 | Active |
| US11302637B2 | Interconnects including dual-metal vias | Electricity | 0 | Active |
| US11430651B2 | Nanosheet transistors with sharp junctions | Electricity | 0 | Active |
| US11152464B1 | Self-aligned isolation for nanosheet transistor | Electricity | 0 | Active |
| US11189528B2 | Subtractive RIE interconnect | Electricity | 0 | Active |
| US10872809B2 | Contact structures for integrated circuit products | Electricity | 0 | Active |
| US10586741B2 | Gate height and spacer uniformity | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.