Cyrille Le Royer
21Patents
3h-index
22Co-inventors
59Inventor score
Filing activity: Dec 1, 2006 → Oct 14, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9117805B2 | Air-spacer MOS transistor | Electricity | 12 | Active |
| US9502558B2 | Local strain generation in an SOI substrate | Electricity | 4 | Active |
| US7759175B2 | Fabrication method of a mixed substrate and use of the substrate for producing circuits | Electricity | 3 | Active |
| US8581310B2 | Z2FET field-effect transistor with a vertical subthreshold slope and with no impact ionization | Electricity | 3 | Active |
| US7732282B2 | Transistor of the I-MOS type comprising two independent gates and method of using such a transistor | Electricity | 3 | Active |
| US9099555B2 | Tunnel field effect transistor | Electricity | 3 | Active |
| US8634229B2 | Dynamic memory cell provided with a field-effect transistor having zero swing | Electricity | 2 | Active |
| US9252269B2 | Tunnel effect transistor | Electricity | 2 | Active |
| US11217446B2 | Method for fabricating an integrated circuit including a NMOS transistor and a PMOS transistor | Electricity | 1 | Active |
| US9276102B2 | Tunnel transistor with high current by bipolar amplification | Electricity | 1 | Active |
| US9911820B2 | Method for fabrication of a field-effect with reduced stray capacitance | Electricity | 1 | Active |
| US11941485B2 | Method of making a quantum device | Physics | 0 | Active |
| US11854805B2 | Method for producing SiGe-based zones at different concentrations of Ge | Electricity | 0 | Active |
| US11121043B2 | Fabrication of transistors having stressed channels | Electricity | 0 | Active |
| US12389644B2 | Method for manufacturing a transistor with a gate-all-around structure | Electricity | 0 | Active |
| US12408405B2 | Device comprising spacers including a localised airgap and associated manufacturing methods | Electricity | 0 | Active |
| US11362181B2 | Method for manufacturing an electronic component having multiple quantum dots | Electricity | 0 | Active |
| US11387147B2 | Method for producing a component by filling a cavity within an electrical isolation area with carbon-based material | Electricity | 0 | Active |
| US11515148B2 | Method for producing at least one device in compressive strained semiconductor | Electricity | 0 | Active |
| US8822332B2 | Method for forming gate, source, and drain contacts on a MOS transistor | Electricity | 0 | Active |
| US11081399B2 | Method of producing microelectronic components | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.