David Paul Brunco
30Patents
5h-index
44Co-inventors
65Inventor score
Filing activity: Jan 30, 2004 → Nov 29, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6869892B1 | Method of oxidizing work pieces and oxidation system | Electricity | 16 | Expired |
| US8828839B2 | Methods for fabricating electrically-isolated finFET semiconductor devices | Emerging Cross-Sectional Technologies | 13 | Active |
| US7517765B2 | Method for forming germanides and devices obtained thereof | Electricity | 7 | Active |
| US10014409B1 | Method and structure to provide integrated long channel vertical FinFET device | Electricity | 7 | Active |
| US9006705B2 | Device with strained layer for quantum well confinement and method for manufacturing thereof | Electricity | 5 | Active |
| US9299809B2 | Methods of forming fins for a FinFET device wherein the fins have a high germanium content | Electricity | 5 | Active |
| US9583557B2 | Integrated circuits including a MIMCAP device and methods of forming the same for long and controllable reliability lifetime | Electricity | 5 | Active |
| US10002793B1 | Sub-fin doping method | Electricity | 4 | Active |
| US10347541B1 | Active gate contacts and method of fabrication thereof | Electricity | 4 | Active |
| US9029217B1 | Band engineered semiconductor device and method for manufacturing thereof | Electricity | 4 | Active |
| US9911740B2 | Method, apparatus, and system having super steep retrograde well with engineered dopant profiles | Electricity | 3 | Active |
| US8207030B2 | Method for producing nMOS and pMOS devices in CMOS processing | Electricity | 3 | Active |
| US9929159B2 | Method, apparatus, and system having super steep retrograde well with silicon and silicon germanium fins | Electricity | 2 | Active |
| US8963225B2 | Band engineered semiconductor device and method for manufacturing thereof | Electricity | 1 | Active |
| US10403742B2 | Field-effect transistors with fins formed by a damascene-like process | Electricity | 1 | Active |
| US10811422B2 | Semiconductor recess to epitaxial regions and related integrated circuit structure | Electricity | 1 | Active |
| US10062612B2 | Method and system for constructing FINFET devices having a super steep retrograde well | Electricity | 0 | Active |
| US9953872B2 | Semiconductor structure with self-aligned wells and multiple channel materials | Electricity | 0 | Active |
| US10325811B2 | Field-effect transistors with fins having independently-dimensioned sections | Electricity | 0 | Active |
| US8828826B2 | Method for manufacturing a transistor device comprising a germanium based channel layer | Electricity | 0 | Active |
| US9490123B2 | Methods of forming strained epitaxial semiconductor material(S) above a strain-relaxed buffer layer | Electricity | 0 | Active |
| US8354344B2 | Methods for forming metal-germanide layers and devices obtained thereby | Electricity | 0 | Active |
| US10727067B2 | Late gate cut using selective conductor deposition | Electricity | 0 | Active |
| US9257557B2 | Semiconductor structure with self-aligned wells and multiple channel materials | Electricity | 0 | Active |
| US9793168B2 | Semiconductor structure with self-aligned wells and multiple channel materials | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.