Maud Vinet
90Patents
7h-index
69Co-inventors
71Inventor score
Filing activity: Dec 16, 2003 → Apr 11, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8183630B2 | Circuit with transistors integrated in three dimensions and having a dynamically adjustable threshold voltage VT | Electricity | 252 | Active |
| US8013399B2 | SRAM memory cell having transistors integrated at several levels and the threshold voltage VT of which is dynamically adjustable | Electricity | 228 | Active |
| US8853785B2 | Integrated circuit with electrostatically coupled MOS transistors and method for producing such an integrated circuit | Electricity | 179 | Active |
| US8969148B2 | Method for producing a transistor structure with superimposed nanowires and with a surrounding gate | Emerging Cross-Sectional Technologies | 15 | Active |
| US8116118B2 | Memory cell provided with dual-gate transistors, with independent asymmetric gates | Electricity | 10 | Active |
| US7829916B2 | Transistor with a germanium-based channel encased by a gate electrode and method for producing one such transistor | Electricity | 10 | Active |
| US9105691B2 | Contact isolation scheme for thin buried oxide substrate devices | Electricity | 9 | Active |
| US9252208B1 | Uniaxially-strained FD-SOI finFET | Electricity | 7 | Active |
| US9570465B2 | Dual STI integrated circuit including FDSOI transistors and method for manufacturing the same | Electricity | 6 | Active |
| US8703550B2 | Dual shallow trench isolation liner for preventing electrical shorts | Electricity | 6 | Active |
| US7973350B2 | Strained-channel transistor device | Electricity | 6 | Active |
| US7968945B2 | Microelectronic device provided with transistors coated with a piezoelectric layer | Electricity | 6 | Active |
| US9171757B2 | Dual shallow trench isolation liner for preventing electrical shorts | Electricity | 6 | Active |
| US10468436B2 | Method of manufacturing a LED matrix display device | Electricity | 5 | Active |
| US9570340B2 | Method of etching a crystalline semiconductor material by ion implantation and then chemical etching based on hydrogen chloride | Electricity | 4 | Active |
| US9634103B2 | CMOS in situ doped flow with independently tunable spacer thickness | Electricity | 4 | Active |
| US9876121B2 | Method for making a transistor in a stack of superimposed semiconductor layers | Electricity | 4 | Active |
| US9601511B2 | Low leakage dual STI integrated circuit including FDSOI transistors | Electricity | 4 | Active |
| US8890219B2 | UTBB CMOS imager having a diode junction in a photosensitive area thereof | Electricity | 3 | Active |
| US7812410B2 | Suspended-gate MOS transistor with non-volatile operation | Electricity | 3 | Active |
| US7768821B2 | Non-volatile SRAM memory cell equipped with mobile gate transistors and piezoelectric operation | Physics | 3 | Active |
| US8399316B2 | Method for making asymmetric double-gate transistors | Electricity | 3 | Active |
| US7361592B2 | Method for producing a component comprising at least one germanium-based element and component obtained by such a method | Electricity | 3 | Active |
| US9502292B2 | Dual shallow trench isolation liner for preventing electrical shorts | Electricity | 2 | Active |
| US9337350B2 | Transistor with reduced parasitic capacitance and access resistance of the source and drain, and method of fabrication of the same | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.