Inventor · North Andover, MA, US

Vikram Singh

49Patents
13h-index
75Co-inventors
84Inventor score

Filing activity: Jun 25, 1997 → Dec 10, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US5968275A Methods and apparatus for passivating a substrate in a plasma reactor Electricity 543 Expired
US6596654B1 Gap fill for high aspect ratio structures Electricity 367 Expired
US6846745B1 High-density plasma process for filling high aspect ratio structures Electricity 272 Expired
US6042687A Method and apparatus for improving etch and deposition uniformity in plasma semiconductor processing Electricity 99 Expired
US8926850B2 Plasma processing with enhanced charge neutralization and process control Electricity 54 Active
US8101510B2 Plasma processing apparatus Chemistry; Metallurgy 46 Active
US9123509B2 Techniques for plasma processing a substrate Electricity 32 Active
US6468384B1 Predictive wafer temperature control system and method Electricity 30 Expired
US8312738B2 Integrated controlled freeze zone (CFZ) tower and dividing wall (DWC) for enhanced hydrocarbon recovery Emerging Cross-Sectional Technologies 25 Active
US7001854B1 Hydrogen-based phosphosilicate glass process for gap fill of high aspect ratio structures Electricity 22 Expired
US7397048B2 Technique for boron implantation Electricity 17 Active
US6787483B1 Gap fill for high aspect ratio structures Electricity 16 Expired
US7524743B2 Conformal doping apparatus and method Electricity 14 Active
US7067440B1 Gap fill for high aspect ratio structures Chemistry; Metallurgy 13 Expired
US8188445B2 Ion source Emerging Cross-Sectional Technologies 11 Active
US7453059B2 Technique for monitoring and controlling a plasma process Electricity 11 Active
US9706634B2 Apparatus and techniques to treat substrates using directional plasma and reactive gas Electricity 10 Active
US8450193B2 Techniques for temperature-controlled ion implantation Electricity 7 Active
US7122485B1 Deposition profile modification through process chemistry Electricity 7 Expired
US7863194B2 Implantation of multiple species to address copper reliability Electricity 7 Active
US8664098B2 Plasma processing apparatus Chemistry; Metallurgy 6 Active
US9514912B2 Control of ion angular distribution of ion beams with hidden deflection electrode Electricity 5 Active
US8603591B2 Enhanced etch and deposition profile control using plasma sheath engineering Electricity 5 Active
US8664561B2 System and method for selectively controlling ion composition of ion sources Electricity 5 Active
US7476849B2 Technique for monitoring and controlling a plasma process Electricity 4 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.