Hung Cho Wang
72Patents
7h-index
37Co-inventors
68Inventor score
Filing activity: Dec 13, 2013 → Jan 10, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10038137B2 | MRAM device and method for fabricating the same | Electricity | 44 | Active |
| US9780301B1 | Method for manufacturing mixed-dimension and void-free MRAM structure | Electricity | 14 | Active |
| US10522740B2 | Techniques for MRAM MTJ top electrode to metal layer interface including spacer | Electricity | 12 | Active |
| US10164169B2 | Memory device having a single bottom electrode layer | Electricity | 9 | Active |
| US10790439B2 | Memory cell with top electrode via | Electricity | 9 | Active |
| US10727274B2 | Techniques for MRAM top electrode via connection | Electricity | 8 | Active |
| US9666790B2 | Manufacturing techniques and corresponding devices for magnetic tunnel junction devices | Electricity | 7 | Active |
| US9842986B2 | Semiconductor structure and method of forming the same | Electricity | 7 | Active |
| US10109790B2 | Method for manufacturing mixed-dimension and void-free MRAM structure | Electricity | 6 | Active |
| US10797230B2 | Techniques for MRAM MTJ top electrode to metal layer interface including spacer | Electricity | 4 | Active |
| US11075335B2 | Techniques for MRAM MTJ top electrode connection | Electricity | 4 | Active |
| US10504958B2 | Semiconductor structure and manufacturing method of the same | Electricity | 4 | Active |
| US11005032B2 | Techniques for MRAM MTJ top electrode to metal layer interface including spacer | Electricity | 3 | Active |
| US11355696B2 | Magnetic tunnel junction structures and related methods | Electricity | 3 | Active |
| US10134807B2 | Structure and formation method of integrated circuit structure | Electricity | 2 | Active |
| US10497861B2 | Manufacturing techniques and corresponding devices for magnetic tunnel junction devices | Electricity | 2 | Active |
| US11189659B2 | Techniques for MRAM MTJ top electrode to via interface | Electricity | 2 | Active |
| US11551736B2 | Semiconductor device and method for fabricating the same | Electricity | 2 | Active |
| US10636961B2 | Semiconductor structure and method of forming the same | Electricity | 2 | Active |
| US11043531B2 | Semiconductor structure and manufacturing method of the same | Electricity | 1 | Active |
| US11437433B2 | Techniques for MRAM top electrode via connection | Electricity | 1 | Active |
| US11063208B2 | Embedded MRAM fabrication process for ion beam etching with protection by top electrode spacer | Electricity | 1 | Active |
| US11121308B2 | Sidewall spacer structure for memory cell | Electricity | 1 | Active |
| US11659775B2 | Embedded MRAM fabrication process for ion beam etching with protection by top electrode spacer | Electricity | 1 | Active |
| US10270026B2 | Multilayered spacer structure for a magnetic tunneling junction and method of manufacturing | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.