Kunihiro Oda
24Patents
9h-index
8Co-inventors
64Inventor score
Filing activity: Dec 5, 2001 → Jan 22, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6759143B2 | Tantalum or tungsten target-copper alloy backing plate assembly and production method therefor | Emerging Cross-Sectional Technologies | 24 | Expired |
| US7156963B2 | Tantalum sputtering target and method for preparation thereof | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6723183B2 | Silicide target for depositing less embrittling gate oxide and method of manufacturing silicide target | Emerging Cross-Sectional Technologies | 15 | Expired |
| US7716806B2 | Tantalum sputtering target and method for preparation thereof | Emerging Cross-Sectional Technologies | 13 | Active |
| US8425696B2 | Sputtering target | Chemistry; Metallurgy | 12 | Active |
| US7740717B2 | Tantalum sputtering target and method for preparation thereof | Emerging Cross-Sectional Technologies | 12 | Active |
| US8172960B2 | Tantalum sputtering target and method of manufacturing same | Chemistry; Metallurgy | 11 | Active |
| US7892367B2 | Tantalum sputtering target | Chemistry; Metallurgy | 11 | Active |
| US7699948B2 | Ta sputtering target and method for preparation thereof | Chemistry; Metallurgy | 9 | Expired |
| US8157973B2 | Sputtering target/backing plate bonded body | Chemistry; Metallurgy | 6 | Active |
| US8173093B2 | Iron silicide sputtering target and method for production thereof | Chemistry; Metallurgy | 2 | Active |
| US7740796B2 | Iron silicide powder and method for production thereof | Chemistry; Metallurgy | 2 | Active |
| US7972583B2 | Iron silicide sputtering target and method for production thereof | Chemistry; Metallurgy | 2 | Active |
| US11046616B2 | Tungsten silicide target and method of manufacturing same | Chemistry; Metallurgy | 1 | Active |
| US8158092B2 | Iron silicide powder and method for production thereof | Chemistry; Metallurgy | 0 | Active |
| US10337100B2 | Sputtering target comprising Ni—P alloy or Ni—Pt—P alloy and production method therefor | Performing Operations; Transporting | 0 | Active |
| US10704137B2 | Master alloy for sputtering target and method for producing sputtering target | Electricity | 0 | Active |
| US9732413B2 | Ruthenium-alloy sputtering target | Chemistry; Metallurgy | 0 | Active |
| US10266924B2 | Tantalum sputtering target | Chemistry; Metallurgy | 0 | Active |
| US9845528B2 | Tantalum sputtering target | Chemistry; Metallurgy | 0 | Active |
| US11830711B2 | Cobalt sputtering target | Chemistry; Metallurgy | 0 | Active |
| US10431439B2 | Tantalum sputtering target | Electricity | 0 | Active |
| US11837449B2 | Ti-Nb alloy sputtering target and production method thereof | Chemistry; Metallurgy | 0 | Active |
| US10176974B2 | Tungsten sputtering target and method for producing same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.