Yuichi Oshima
32Patents
7h-index
21Co-inventors
69Inventor score
Filing activity: Oct 21, 1999 → Apr 26, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6924159B2 | Semiconductor substrate made of group III nitride, and process for manufacture thereof | Electricity | 56 | Expired |
| US7196399B2 | Epitaxially grown nitride-based compound semiconductor crystal substrate structure with low dislocation density | Electricity | 21 | Expired |
| US6812051B2 | Method of forming an epitaxially grown nitride-based compound semiconductor crystal substrate structure and the same substrate structure | Electricity | 16 | Expired |
| US7189588B2 | Group III nitride semiconductor substrate and its manufacturing method | Electricity | 13 | Expired |
| US7829913B2 | Porous substrate and its manufacturing method, and gan semiconductor multilayer substrate and its manufacturing method | Electricity | 12 | Active |
| US7118934B2 | Porous substrate for epitaxial growth, method for manufacturing same, and method for manufacturing III-nitride semiconductor substrate | Electricity | 11 | Expired |
| US7097920B2 | Group III nitride based semiconductor substrate and process for manufacture thereof | Emerging Cross-Sectional Technologies | 8 | Expired |
| US7791103B2 | Group III nitride semiconductor substrate | Electricity | 6 | Active |
| US7906412B2 | Method of fabricating group III nitride semiconductor single crystal, and method of fabricating group III nitride semiconductor single crystal substrate | Electricity | 3 | Active |
| US7662488B2 | Nitride-based semiconductor substrate and method of making the same | Electricity | 2 | Active |
| US7271404B2 | Group III-V nitride-based semiconductor substrate and method of making same | Electricity | 2 | Expired |
| US7348278B2 | Method of making nitride-based compound semiconductor crystal and substrate | Electricity | 2 | Active |
| US6306966A | Moisture curable composition | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8624356B2 | Group III nitride semiconductor substrate production method, and group III nitride semiconductor substrate | Electricity | 1 | Active |
| US7075111B2 | Nitride semiconductor substrate and its production method | Electricity | 1 | Expired |
| US8690636B2 | Compound semiconductor substrate production method | Emerging Cross-Sectional Technologies | 1 | Active |
| US8329650B2 | Method of treating ischemic injury with follistatin-like 1 polypeptide | Human Necessities | 1 | Active |
| US8829651B2 | Nitride-based semiconductor substrate and semiconductor device | Electricity | 1 | Active |
| US9246049B2 | Nitride-based semiconductor substrate and semiconductor device | Electricity | 1 | Active |
| US7728323B2 | Nitride-based semiconductor substrate, method of making the same and epitaxial substrate for nitride-based semiconductor light emitting device | Electricity | 1 | Active |
| US11804519B2 | Crystalline multilayer structure, semiconductor device, and method of manufacturing crystalline structure | Electricity | 0 | Active |
| US8715413B2 | Method for manufacturing a group III nitride semiconductor crystal and method for manufacturing a group III nitride semiconductor substrate | Chemistry; Metallurgy | 0 | Active |
| US10060047B2 | Nitride semiconductor crystal producing method including growing nitride semiconductor crystal over seed crystal substrate | Electricity | 0 | Active |
| US8975230B2 | Method of treating ischemic injury with follistatin-like 1 polypeptide | Human Necessities | 0 | Active |
| US8786052B2 | Nitride semiconductor crystal producing method, nitride semiconductor epitaxial wafer, and nitride semiconductor freestanding substrate | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.