ATOMERA INCORPORATED
106Patents
105Active
106Granted
61Portfolio score
Filing activity: Nov 21, 2014 → Jul 2, 2024
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9558939B1 | Methods for making a semiconductor device including atomic layer structures using N2O as an oxygen source | Electricity | 98 | Active |
| US9406753B2 | Semiconductor devices including superlattice depletion layer stack and related methods | Electricity | 98 | Active |
| US9899479B2 | Semiconductor devices with superlattice layers providing halo implant peak confinement and related methods | Electricity | 83 | Active |
| US10084045B2 | Semiconductor device including a superlattice and replacement metal gate structure and related methods | Electricity | 68 | Active |
| US10109342B2 | Dram architecture to reduce row activation circuitry power and peripheral leakage and related methods | Physics | 67 | Active |
| US10107854B2 | Semiconductor device including threshold voltage measurement circuitry | Electricity | 65 | Active |
| US10109479B1 | Method of making a semiconductor device with a buried insulating layer formed by annealing a superlattice | Electricity | 65 | Active |
| US9941359B2 | Semiconductor devices with superlattice and punch-through stop (PTS) layers at different depths and related methods | Electricity | 65 | Active |
| US9972685B2 | Vertical semiconductor devices including superlattice punch through stop layer and related methods | Electricity | 59 | Active |
| US10170603B2 | Semiconductor device including a resonant tunneling diode structure with electron mean free path control layers | Electricity | 57 | Active |
| US10191105B2 | Method for making a semiconductor device including threshold voltage measurement circuitry | Electricity | 57 | Active |
| US10170560B2 | Semiconductor devices with enhanced deterministic doping and related methods | Electricity | 56 | Active |
| US10170604B2 | Method for making a semiconductor device including a resonant tunneling diode with electron mean free path control layers | Electricity | 56 | Active |
| US10276625B1 | CMOS image sensor including superlattice to enhance infrared light absorption | Electricity | 49 | Active |
| US10249745B2 | Method for making a semiconductor device including a resonant tunneling diode structure having a superlattice | Electricity | 48 | Active |
| US10304881B1 | CMOS image sensor with buried superlattice layer to reduce crosstalk | Electricity | 48 | Active |
| US10593761B1 | Method for making a semiconductor device having reduced contact resistance | Electricity | 44 | Active |
| US10367028B2 | CMOS image sensor including stacked semiconductor chips and image processing circuitry including a superlattice | Electricity | 43 | Active |
| US10580866B1 | Semiconductor device including source/drain dopant diffusion blocking superlattices to reduce contact resistance | Electricity | 42 | Active |
| US10566191B1 | Semiconductor device including superlattice structures with reduced defect densities | Electricity | 42 | Active |
| US10468245B2 | Semiconductor device including compound semiconductor materials and an impurity and point defect blocking superlattice | Electricity | 41 | Active |
| US10608043B2 | Method for making CMOS image sensor including stacked semiconductor chips and readout circuitry including a superlattice | Electricity | 41 | Active |
| US10461118B2 | Method for making CMOS image sensor including photodiodes with overlying superlattices to reduce crosstalk | Electricity | 40 | Active |
| US10580867B1 | FINFET including source and drain regions with dopant diffusion blocking superlattice layers to reduce contact resistance | Electricity | 40 | Active |
| US10381242B2 | Method for making a semiconductor device including a superlattice as a gettering layer | Electricity | 40 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.