Shui-Yen Lu
37Patents
4h-index
65Co-inventors
62Inventor score
Filing activity: May 29, 2008 → Jun 13, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8980701B1 | Method of forming semiconductor device | Electricity | 16 | Active |
| US9716165B1 | Field-effect transistor and method of making the same | Electricity | 9 | Active |
| US8574990B2 | Method of manufacturing semiconductor device having metal gate | Electricity | 7 | Active |
| US8026571B2 | Semiconductor-device isolation structure | Electricity | 4 | Active |
| US9443741B1 | Etching method for reducing microloading effect | Electricity | 3 | Active |
| US8592321B2 | Method for fabricating an aperture | Electricity | 3 | Active |
| US9899491B2 | Semiconductor device and method of forming the same | Electricity | 3 | Active |
| US8709930B2 | Semiconductor process | Electricity | 2 | Active |
| US9502259B2 | Semiconductor device and method for fabricating the same | Electricity | 2 | Active |
| US9627538B2 | Fin field effect transistor and method of manufacturing the same | Electricity | 1 | Active |
| US10505007B1 | Semiconductor device having asymmetric work function metal layer | Electricity | 1 | Active |
| US8835243B2 | Semiconductor process | Electricity | 1 | Active |
| US9373718B2 | Etching method for forming grooves in Si-substrate and fin field-effect transistor | Electricity | 1 | Active |
| US9755057B1 | Method of fabricating a semiconductor device | Electricity | 1 | Active |
| US8252650B1 | Method for fabricating CMOS transistor | Electricity | 1 | Active |
| US9165997B2 | Semiconductor process | Electricity | 1 | Active |
| US9245972B2 | Method for manufacturing semiconductor device | Electricity | 0 | Active |
| US9443952B2 | Method of forming semiconductor device | Electricity | 0 | Active |
| US9761697B2 | Semiconductor device and method for fabricating the same | Electricity | 0 | Active |
| US9685541B2 | Method for forming semiconductor structure | Electricity | 0 | Active |
| US10043882B2 | Method of forming semiconductor device | Electricity | 0 | Active |
| US9627541B2 | Non-planar transistor and method of forming the same | Electricity | 0 | Active |
| US12040392B2 | High electron mobility transistor and method for fabricating the same | Electricity | 0 | Active |
| US9305847B2 | Method of manufacturing semiconductor device having gate metal | Electricity | 0 | Active |
| US9461147B2 | Semiconductor structure | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.