Sundar Narayanan
35Patents
7h-index
23Co-inventors
69Inventor score
Filing activity: Jan 2, 2001 → Mar 31, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6943126B1 | Deuterium incorporated nitride | Electricity | 17 | Expired |
| US9595670B1 | Resistive random access memory (RRAM) cell and method for forming the RRAM cell | Electricity | 17 | Active |
| US6774012B1 | Furnace system and method for selectively oxidizing a sidewall surface of a gate conductor by oxidizing a silicon sidewall in lieu of a refractory metal sidewall | Electricity | 14 | Expired |
| US9697874B1 | Monolithic memory comprising 1T1R code memory and 1TnR storage class memory | Electricity | 14 | Active |
| US9741765B1 | Monolithically integrated resistive memory using integrated-circuit foundry compatible processes | Electricity | 12 | Active |
| US7189652B1 | Selective oxidation of gate stack | Electricity | 12 | Expired |
| US7351663B1 | Removing whisker defects | Electricity | 7 | Expired |
| US6803321B1 | Nitride spacer formation | Electricity | 6 | Expired |
| US10319908B2 | Integrative resistive memory in backend metal layers | Electricity | 6 | Active |
| US9209396B2 | Regulating interface layer growth with N2O for two-terminal memory | Electricity | 6 | Active |
| US6794269B1 | Method for and structure formed from fabricating a relatively deep isolation structure | Electricity | 6 | Expired |
| US9425046B1 | Method for surface roughness reduction after silicon germanium thin film deposition | Electricity | 5 | Active |
| US9437814B1 | Mitigating damage from a chemical mechanical planarization process | Electricity | 5 | Active |
| US7371637B2 | Oxide-nitride stack gate dielectric | Electricity | 5 | Expired |
| US6773975B1 | Formation of a shallow trench isolation structure in integrated circuits | Electricity | 4 | Expired |
| US10062845B1 | Flatness of memory cell surfaces | Electricity | 4 | Active |
| US8445381B2 | Oxide-nitride stack gate dielectric | Electricity | 4 | Active |
| US10693062B2 | Regulating interface layer formation for two-terminal memory | Electricity | 3 | Active |
| US6905893B1 | Method and structure for determining a concentration profile of an impurity within a semiconductor layer | Electricity | 2 | Expired |
| US6803330B2 | Method for growing ultra thin nitrided oxide | Electricity | 2 | Expired |
| US10522754B2 | Liner layer for dielectric block layer | Electricity | 2 | Active |
| US10290801B2 | Scalable silicon based resistive memory device | Electricity | 2 | Active |
| US6964929B1 | Method of forming a narrow gate, and product produced thereby | Electricity | 2 | Expired |
| US7172914B1 | Method of making uniform oxide layer | Electricity | 1 | Expired |
| US10115819B2 | Recessed high voltage metal oxide semiconductor transistor for RRAM cell | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.