Khaled Ahmed
29Patents
8h-index
42Co-inventors
75Inventor score
Filing activity: Jun 5, 2000 → Jul 26, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7910446B2 | Integrated scheme for forming inter-poly dielectrics for non-volatile memory devices | Electricity | 40 | Active |
| US8043907B2 | Atomic layer deposition processes for non-volatile memory devices | Electricity | 38 | Active |
| US9246013B2 | IGZO devices with composite channel layers and methods for forming the same | Electricity | 21 | Active |
| US6472233B1 | MOSFET test structure for capacitance-voltage measurements | Electricity | 20 | Expired |
| US7659158B2 | Atomic layer deposition processes for non-volatile memory devices | Electricity | 18 | Active |
| US7078302B2 | Gate electrode dopant activation method for semiconductor manufacturing including a laser anneal | Electricity | 17 | Expired |
| US9082793B1 | IGZO devices with reduced threshhold voltage shift and methods for forming the same | Electricity | 12 | Active |
| US7902018B2 | Fluorine plasma treatment of high-k gate stack for defect passivation | Electricity | 8 | Active |
| US7727828B2 | Method for fabricating a gate dielectric of a field effect transistor | Electricity | 7 | Active |
| US7871942B2 | Methods for manufacturing high dielectric constant film | Electricity | 6 | Active |
| US7888217B2 | Method for fabricating a gate dielectric of a field effect transistor | Emerging Cross-Sectional Technologies | 5 | Active |
| US9722049B2 | Methods for forming crystalline IGZO with a seed layer | Electricity | 3 | Active |
| US7611976B2 | Gate electrode dopant activation method for semiconductor manufacturing | Electricity | 3 | Active |
| US8993058B2 | Methods and apparatus for forming tantalum silicate layers on germanium or III-V semiconductor devices | Electricity | 2 | Active |
| US9076641B2 | Ultra-low resistivity contacts | Electricity | 2 | Active |
| US9076651B1 | Gate stacks and ohmic contacts for SiC devices | Electricity | 1 | Active |
| US9177791B2 | Systems and methods for forming semiconductor devices | Electricity | 1 | Active |
| US9093264B2 | Methods and apparatus for forming silicon passivation layers on germanium or III-V semiconductor devices | Electricity | 1 | Active |
| US9441298B2 | Devices including metal-silicon contacts using indium arsenide films and apparatus and methods | Electricity | 0 | Active |
| US8906709B1 | Combinatorially variable etching of stacks including two dissimilar materials for etch pit density inspection | Electricity | 0 | Active |
| US9373516B2 | Method and apparatus for forming gate stack on Si, SiGe or Ge channels | Electricity | 0 | Active |
| US12119367B2 | Composite substrate for fabricating III-V photodetector arrays | Electricity | 0 | Active |
| US9082729B2 | Combinatorial method for solid source doping process development | Electricity | 0 | Active |
| US9190320B2 | Devices including metal-silicon contacts using indium arsenide films and apparatus and methods | Electricity | 0 | Active |
| US8975706B2 | Gate stacks including TaXSiYO for MOSFETS | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.