Inventor · Mannheim, DE

Michael Lauter

24Patents
2h-index
36Co-inventors
57Inventor score

Filing activity: Oct 4, 2002 → Sep 14, 2023

Most-cited inventions

PatentTitleAreaCited byStatus
US9777192B2 Chemical mechanical polishing (CMP) composition comprising a protein Electricity 2 Active
US10647900B2 Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors Electricity 2 Active
US6662594B2 Apparatus and process for producing gaseous oxygen under elevated pressure Emerging Cross-Sectional Technologies 2 Expired
US8980750B2 Chemical mechanical polishing (CMP) composition comprising a non-ionic surfactant and a carbonate salt Electricity 2 Active
US6708523B2 Process and apparatus for producing high-purity nitrogen by low-temperature fractionation of air Emerging Cross-Sectional Technologies 2 Expired
US10899945B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates Electricity 2 Active
US10385236B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Electricity 2 Active
US9255214B2 Chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particles Electricity 1 Active
US10844325B2 Composition for post chemical-mechanical-polishing cleaning Chemistry; Metallurgy 0 Active
US10738219B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Chemistry; Metallurgy 0 Active
US12351737B2 Chemical mechanical polishing of substrates containing copper and ruthenium Electricity 0 Active
US10570316B2 Chemical mechanical polishing (CMP) composition Chemistry; Metallurgy 0 Active
US11993729B2 Chemical mechanical polishing composition Electricity 0 Active
US12378439B2 Compositions for tungsten etching inhibition Electricity 0 Active
US10865361B2 Composition for post chemical-mechanical-polishing cleaning Chemistry; Metallurgy 0 Active
US9263296B2 Chemical mechanical polishing (CMP) composition comprising two types of corrosion inhibitors Chemistry; Metallurgy 0 Active
US11168239B2 Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors Electricity 0 Active
US11264250B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Chemistry; Metallurgy 0 Active
US11725117B2 Chemical mechanical polishing of substrates containing copper and ruthenium Chemistry; Metallurgy 0 Active
US11286402B2 Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substrates Electricity 0 Active
US9487674B2 Chemical mechanical polishing (CMP) composition comprising a glycoside Electricity 0 Active
US10407594B2 Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine Electricity 0 Active
US10227506B2 Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germanium Electricity 0 Active
US10844333B2 Composition for post chemical-mechanical-polishing cleaning Chemistry; Metallurgy 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.