Werner Schustereder
55Patents
4h-index
72Co-inventors
65Inventor score
Filing activity: Jul 18, 2012 → Oct 5, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9613805B1 | Method for forming a semiconductor device | Electricity | 7 | Active |
| US9012980B1 | Method of manufacturing a semiconductor device including proton irradiation and semiconductor device including charge compensation structure | Electricity | 5 | Active |
| US10903078B2 | Methods for processing a silicon carbide wafer, and a silicon carbide semiconductor device | Electricity | 5 | Active |
| US9564495B2 | Semiconductor device with a semiconductor body containing hydrogen-related donors | Electricity | 4 | Active |
| US8710620B2 | Method of manufacturing semiconductor devices using ion implantation | Electricity | 4 | Active |
| US8859409B2 | Semiconductor component comprising a dopant region in a semiconductor body and a method for producing a dopant region in a semiconductor body | Electricity | 2 | Active |
| US10109489B2 | Method for producing a superjunction device | Electricity | 2 | Active |
| US10096677B2 | Methods for forming a semiconductor device and a semiconductor device | Electricity | 2 | Active |
| US10366895B2 | Methods for forming a semiconductor device using tilted reactive ion beam | Electricity | 1 | Active |
| US10128328B2 | Method of manufacturing semiconductor devices and semiconductor device containing hydrogen-related donors | Electricity | 1 | Active |
| US9812563B2 | Transistor with field electrodes and improved avalanche breakdown behavior | Electricity | 1 | Active |
| US9105487B2 | Super junction semiconductor device | Electricity | 1 | Active |
| US10679855B2 | Method for producing a superjunction device | Electricity | 1 | Active |
| US11171230B2 | Semiconductor device and method for manufacturing a semiconductor device | Electricity | 1 | Active |
| US10573533B2 | Method of reducing a sheet resistance in an electronic device, and an electronic device | Electricity | 1 | Active |
| US10083835B2 | Forming electrode trenches by using a directed ion beam and semiconductor device with trench electrode structures | Electricity | 1 | Active |
| US9825131B2 | Method of manufacturing semiconductor devices and semiconductor device containing oxygen-related thermal donors | Electricity | 1 | Active |
| US10037887B2 | Method for implanting ions into a semiconductor substrate and an implantation system | Electricity | 1 | Active |
| US9312135B2 | Method of manufacturing semiconductor devices including generating and annealing radiation-induced crystal defects | Electricity | 1 | Active |
| US11195695B2 | Ion implantation method, ion implantation apparatus and semiconductor device | Electricity | 1 | Active |
| US9972704B2 | Method for forming a semiconductor device and a semiconductor device | Electricity | 1 | Active |
| US10074715B2 | Semiconductor wafer, implantation apparatus for implanting protons and method for forming a semiconductor device | Electricity | 1 | Active |
| US9412824B2 | Semiconductor component having a dopant region formed by a dopant composed of an oxygen/vacancy complex | Electricity | 1 | Active |
| US10622268B2 | Apparatus and method for ion implantation | Electricity | 0 | Active |
| US10002930B2 | Forming a contact layer on a semiconductor body | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.