Perrine Batude
24Patents
4h-index
25Co-inventors
59Inventor score
Filing activity: May 15, 2009 → Sep 16, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8183630B2 | Circuit with transistors integrated in three dimensions and having a dynamically adjustable threshold voltage VT | Electricity | 252 | Active |
| US8013399B2 | SRAM memory cell having transistors integrated at several levels and the threshold voltage VT of which is dynamically adjustable | Electricity | 228 | Active |
| US8853785B2 | Integrated circuit with electrostatically coupled MOS transistors and method for producing such an integrated circuit | Electricity | 179 | Active |
| US9502566B2 | Method for producing a field effect transistor including forming a gate after forming the source and drain | Electricity | 9 | Active |
| US9246006B2 | Recrystallization of source and drain blocks from above | Electricity | 4 | Active |
| US9018078B2 | Method of making a 3D integrated circuit | Electricity | 3 | Active |
| US9379213B2 | Method for forming doped areas under transistor spacers | Electricity | 2 | Active |
| US9343375B2 | Method for manufacturing a transistor in which the strain applied to the channel is increased | Electricity | 2 | Active |
| US9966453B2 | Method for doping source and drain regions of a transistor by means of selective amorphisation | Electricity | 2 | Active |
| US10170621B2 | Method of making a transistor having a source and a drain obtained by recrystallization of semiconductor | Electricity | 2 | Active |
| US9761607B2 | Method for producing strained semi-conductor blocks on the insulating layer of a semi-conductor on insulator substrate | Electricity | 2 | Active |
| US11658260B2 | Method of manufacturing an optoelectronic device comprising a plurality of diodes | Electricity | 1 | Active |
| US10586740B2 | Method for manufacturing pairs of CMOS transistors of the “fin-FET” type at low temperatures | Electricity | 1 | Active |
| US8722471B2 | Method for forming a via contacting several levels of semiconductor layers | Electricity | 1 | Active |
| US10553702B2 | Transistor with controlled overlap of access regions | Electricity | 0 | Active |
| US12154930B2 | Three-dimensional microelectronic circuit with optimised distribution of its digital and analogue functions | Electricity | 0 | Active |
| US10651202B2 | 3D circuit transistors with flipped gate | Electricity | 0 | Active |
| US11011425B2 | Production of a 3D circuit with upper level transistor provided with a gate dielectric derived from a substrate transfer | Electricity | 0 | Active |
| US11888007B2 | Image sensor formed in sequential 3D technology | Electricity | 0 | Active |
| US10319628B2 | Integrated circuit having a plurality of active layers and method of fabricating the same | Electricity | 0 | Active |
| US11139209B2 | 3D circuit provided with mesa isolation for the ground plane zone | Electricity | 0 | Active |
| US11552125B2 | Method of manufacturing an optoelectronic device comprising a plurality of diodes and an electronic circuit for controlling these diodes | Electricity | 0 | Active |
| US9779982B2 | Fabrication method of a stack of electronic devices | Electricity | 0 | Active |
| US10497627B2 | Method of manufacturing a dopant transistor located vertically on the gate | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.